scholarly journals Ultrafast laser processing of transparent materials supported by in-situ diagnostics

2021 ◽  
Author(s):  
Malte Kumkar ◽  
Myriam Kaiser ◽  
Jonas Kleiner ◽  
Daniel Günther Grossmann ◽  
Daniel Flamm ◽  
...  

For the development of industrial NIR ultrafast laser processing of transparent materials, the absorption inside the bulk material has to be controlled. Applications we aim for are front and rear side ablation, drilling and inscription of modifications for cleaving and selective laser etching of glass and sapphire in sheet geometry. We applied pump probe technology and in situ stress birefringence microscopy for fundamental studies on the influence of energy and duration (100 fs – 20 ps), temporal and spatial spacing, focusing and beam shaping of the laser pulses. Applying pump probe technique we are able to visualize differences of spatio-temporal build up of absorption, self focusing, shock wave generation for standard, multispot and beam shaped focusing. Incubation effects and disturbance of beam propagation due to modifications or ablation can be observed. In-situ imaging of stress birefringence gained insight in transient build up of stress with and without translation. The results achieved so far, demonstrate that transient stress has to be taken into account in scaling the laser machining throughput of brittle materials. Furthermore it points out that transient stress birefringence is a good indicator for accumulation effects, supporting tailored processing strategies.Cutting results achieved for selective laser etching by single pass laser modification exemplifies the benefits of process development supported by in situ diagnostics.

2016 ◽  
Author(s):  
M. Kumkar ◽  
M. Kaiser ◽  
J. Kleiner ◽  
D. Grossmann ◽  
D. Flamm ◽  
...  

2004 ◽  
Author(s):  
Z. B. Wang ◽  
Ming Hui Hong ◽  
L. Yin ◽  
Tow Chong Chong

Nanophotonics ◽  
2017 ◽  
Vol 6 (2) ◽  
pp. 393-413 ◽  
Author(s):  
Koji Sugioka

AbstractThe unique characteristics of ultrafast lasers have rapidly revolutionized materials processing after their first demonstration in 1987. The ultrashort pulse width of the laser suppresses heat diffusion to the surroundings of the processed region, which minimizes the formation of a heat-affected zone and thereby enables ultrahigh precision micro- and nanofabrication of various materials. In addition, the extremely high peak intensity can induce nonlinear multiphoton absorption, which extends the diversity of materials that can be processed to transparent materials such as glass. Nonlinear multiphoton absorption enables three-dimensional (3D) micro- and nanofabrication by irradiation with tightly focused femtosecond laser pulses inside transparent materials. Thus, ultrafast lasers are currently widely used for both fundamental research and practical applications. This review presents progress in ultrafast laser processing, including micromachining, surface micro- and nanostructuring, nanoablation, and 3D and volume processing. Advanced technologies that promise to enhance the performance of ultrafast laser processing, such as hybrid additive and subtractive processing, and shaped beam processing are discussed. Commercial and industrial applications of ultrafast laser processing are also introduced. Finally, future prospects of the technology are given with a summary.


2014 ◽  
Author(s):  
Jae-Hyuck Yoo ◽  
Jung Bin In ◽  
Andy Cheng Zheng ◽  
Sang-Gil Ryu ◽  
David J. Hwang ◽  
...  

2021 ◽  
Vol 33 (1) ◽  
pp. 012009
Author(s):  
Aiko Narazaki ◽  
Hideyuki Takada ◽  
Dai Yoshitomi ◽  
Kenji Torizuka ◽  
Yohei Kobayashi

Author(s):  
Ted Kolasa ◽  
Alfredo Mendoza

Abstract Comprehensive in situ (designed-in) diagnostic capabilities have been incorporated into digital microelectronic systems for years, yet similar capabilities are not commonly incorporated into the design of analog microelectronics. And as feature sizes shrink and back end interconnect metallization becomes more complex, the need for effective diagnostics for analog circuits becomes ever more critical. This paper presents concepts for incorporating in situ diagnostic capability into analog circuit designs. Aspects of analog diagnostic system architecture are discussed as well as nodal measurement scenarios for common signal types. As microelectronic feature sizes continue to shrink, diagnostic capabilities such as those presented here will become essential to the process of fault localization in analog circuits.


Author(s):  
V. A. Kurnaev ◽  
V. E. Nikolaeva ◽  
S. A. Krat ◽  
E. D. Vovchenko ◽  
A. V. Kaziev ◽  
...  

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