Preparation of Magnesia Stabilized Zirconia Thin Films for Solid Oxide Fuel Cell by Microwave Plasma Chemical Vapor Deposition.

Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Chinese Physics ◽

10.1088/1009-1963/9/7/015 ◽

2000 ◽

Vol 9 (7) ◽

pp. 545-549

Author(s):

Zhang Yong-ping ◽

Gu You-song ◽

Chang Xiang-rong ◽

Tian Zhong-zhuo ◽

Shi Dong-xia ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Scanning tunneling microscopy investigation of carbon nitride thin films grown by microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00061-9 ◽

1999 ◽

Vol 349 (1-2) ◽

pp. 10-13 ◽

Cited By ~ 13

Author(s):

L.P. Ma ◽

Y.S. Gu ◽

Z.J. Duan ◽

L. Yuan ◽

S.J. Pang

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Scanning Tunneling ◽

Tunneling Microscopy ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Microscopy Investigation

Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Cited By ~ 5

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Thin Films ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Growth of NdBaCuO Superconducting Thin Films Using Mist Microwave-Plasma Chemical Vapor Deposition with Dual Sources

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l553 ◽

1997 ◽

Vol 36 (Part 2, No. 5A) ◽

pp. L553-L555 ◽

Cited By ~ 3

Author(s):

Naoyuki Takahashi ◽

Naoyuki Takeda ◽

Akinori Koukitu ◽

Hisashi Seki

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Cited By ~ 5

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Cited By ~ 11

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Microwave plasma chemical vapor deposition of graphitic carbon thin films

Carbon ◽

10.1016/j.carbon.2009.12.052 ◽

2010 ◽

Vol 48 (5) ◽

pp. 1552-1557 ◽

Cited By ~ 12

Author(s):

Marek Marcinek ◽

Laurence J. Hardwick ◽

Grażyna Z. Żukowska ◽

Robert Kostecki

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Graphitic Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Carbon Thin Films

Effects of methane gas flow rate on the optoelectrical properties of nitrogenated carbon thin films grown by surface wave microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2005.07.034 ◽

2006 ◽

Vol 15 (2-3) ◽

pp. 371-377 ◽

Cited By ~ 21

Author(s):

M. Rusop ◽

S. Adhikari ◽

A.M.M. Omer ◽

T. Soga ◽

T. Jimbo ◽

...

Keyword(s):

Thin Films ◽

Surface Wave ◽

Vapor Deposition ◽

Gas Flow ◽

Microwave Plasma ◽

Chemical Vapor ◽

Gas Flow Rate ◽

Plasma Chemical ◽

Field emission investigation of boron doped diamond thin films synthesized by microwave plasma chemical vapor deposition: Effect of vacuum annealing

2009 22nd International Vacuum Nanoelectronics Conference ◽

10.1109/ivnc.2009.5271662 ◽

2009 ◽

Author(s):

P.M. Koinkar ◽

D. Yonekura ◽

T.G. Kim ◽

M. A. More ◽

R. Murakami

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Vacuum Annealing ◽

Chemical Vapor ◽

Plasma Chemical ◽

Boron Doped Diamond ◽

Plasma Chemical Vapor Deposition ◽

Boron Doped ◽

Deposition Effect

Effect of Ag addition on YBa2Cu3O7 − δ superconducting thin films prepared by mist microwave-plasma chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(96)00420-4 ◽

1996 ◽

Vol 169 (3) ◽

pp. 463-468 ◽

Cited By ~ 1

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Ag Addition ◽