scholarly journals EXTREME HOTSPOT HEAT FLUX THERMAL MANAGEMENT VIA THIN-FILM EVAPORATION FROM MICROSTRUCTURED SURFACES

Author(s):  
S. Adera ◽  
D. Antao ◽  
B. Barabadi ◽  
R. Raj ◽  
E.N. Wang
Author(s):  
Solomon Adera ◽  
Rishi Raj ◽  
Evelyn N. Wang

Thermal management is increasingly becoming a bottleneck for a variety of high power density applications such as integrated circuits, solar cells, microprocessors, and energy conversion devices. The performance and reliability of these devices are usually limited by the rate at which heat can be removed from the device footprint, which averages well above 100 W/cm2 (locally this heat flux can exceed 1000 W/cm2). State-of-the-art air cooling strategies which utilize the sensible heat are insufficient at these large heat fluxes. As a result, novel thermal management solutions such as via thin-film evaporation that utilize the latent heat of vaporization of a fluid are needed. The high latent heat of vaporization associated with typical liquid-vapor phase change phenomena allows significant heat transfer with small temperature rise. In this work, we demonstrate a promising thermal management approach where square arrays of cylindrical micropillar arrays are used for thin-film evaporation. The microstructures control the liquid film thickness and the associated thermal resistance in addition to maintaining a continuous liquid supply via the capillary pumping mechanism. When the capillary-induced liquid supply mechanism cannot deliver sufficient liquid for phase change heat transfer, the critical heat flux is reached and dryout occurs. This capillary limitation on thin-film evaporation was experimentally investigated by fabricating well-defined silicon micropillar arrays using standard contact photolithography and deep reactive ion etching. A thin film resistive heater and thermal sensors were integrated on the back side of the test sample using e-beam evaporation and acetone lift-off. The experiments were carried out in a controlled environmental chamber maintained at the water saturation pressure of ≈3.5 kPa and ≈25 °C. We demonstrated significantly higher heat dissipation capability in excess of 100 W/cm2. These preliminary results suggest the potential of thin-film evaporation from microstructured surfaces for advanced thermal management applications.


Author(s):  
Hani H. Sait ◽  
Steve M. Demsky ◽  
HongBin Ma

An analytical model describing thin film evaporation is developed that includes the effects of surface tension, frictional shear stress, wetting characteristics and disjoining pressure. The effects of thermal conductivity of working fluids and operating temperature on the evaporating thin film region are also studied. The results indicate that when the thermal conductivity of the working fluid increases, a high heat flux can be removed from the evaporating thin film region. The operating temperature affects the thin film evaporation. The higher the operating temperature, the more heat flux can be removed from the region. The information of thin film evaporation presented in the paper results in a better understanding of heat transfer mechanism occurring in micro heat pipes.


Author(s):  
Chen Li ◽  
G. P. Peterson ◽  
Ji Li ◽  
Nikhil Koratkar

The thin film evaporation process through use of thin micro-scale sintered copper mesh screen was proven to be a very effective heat transfer mechanism with high critical heat flux (CHF). This efficient heat transfer mechanism is widely used in designing heat pipe, Capillary Pumped Loops (CPL), and drying process, however, the nucleation process and meniscus dynamics at the liquid-vapor-solid interface are not directly observed and systematically studied. Very few visual investigation in thin film evaporation has been conducted. In the existing two visual studies, the interface thermal resistance between coating and the heated wall was not seriously considered, and the heat flux was limited below 35 W/cm2. In this visualization investigation, the nucleation process and meniscus dynamics from initial condition to drying out were observed and well documented. To minimize the interface thermal resistance, the micro scale wicking was sintered to heated wall directly. High quality images were acquired through a well-designed visualization system. The majority of nucleate bubbles, whose diameters are at a magnitude of 10 μm, were found to form on the top wire surfaces instead of inside the porous media at moderate heat flux. Few large size bubbles were observed to grow inside capillary wicks, however, their presence did not seem to stop the evaporation process as reported before. The menisci receding process was visually captured for the first time. The minimum menisci radius was found to form at the smallest corners and pores. It is also illustrated the thin liquid area increases when the menisci recede and the thin liquid film evaporation is the dominant heat transfer mode at high heat flux. The present work visually confirms the heat transfer regimes of evaporation on micro porous media, which was proposed by Li and Peterson [2], and further improves the understanding to the nucleate boiling and thin liquid film evaporation on the surfaces of micro sintered copper mesh screen.


Author(s):  
Rong Xiao ◽  
Shalabh C. Maroo ◽  
Evelyn N. Wang

Recent advancements in integrated circuits demand the development of novel thermal management schemes that can dissipate ultra-high heat fluxes with high heat transfer coefficients. Previous study demonstrated the potential of thin film evaporation on micro/nanostructured surfaces [1–11]. Theoretical calculations indicate that heat transfer coefficients on the order of 106 W/m2K and heat fluxes of 105 W/cm2 can be achievable with water [1, 5–6]. However, in previous experimental setup, the coolant has to propagate across the surface which limits the increase in heat flux and the heat transfer coefficient, while adding complexity to the system design. This work aims to decouple the propagation of the coolant from the evaporation process through a novel experimental configuration. Thin nanoporous membranes of 13 mm diameter were used where a metal layer was deposited on the top surface to serve as a resistance heater. Liquid was supplied from the bottom of the membrane, driven through the nanopores by capillary force, and evaporated from the top surface. Heat transfer coefficient over 104 W/m2K was obtained with isopropyl alcohol (IPA) as the coolant, which is only two orders of magnitude smaller than the theoretical limit. This work offers insights into optimal experimental designs towards achieving kinetic limits of heat transfer for thin film evaporation based thermal management solutions.


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