scholarly journals Refractive Index of Cadmium Sulfide Films Determined from Transmittance Measurements

2019 ◽  
Vol 3 (4) ◽  
pp. 21-29
Author(s):  
Zaheer Hussain Shah ◽  
Imtiaz Ahmad ◽  
Rabia Nasar
Keyword(s):  
Refractive Index ◽  
Cadmium Sulfide ◽  
Normal Incidence ◽  
Fused Silica ◽  
Refractive Indices ◽  
Silica Substrates

In the present work the refractive indices of thermally evaporated films of cadmium sulfide (CdS) on fused silica substrates were obtained from measurement of transmittance (T, alone) at normal incidence. Earlier, the same were determined by using measurements of reflectance (R) and transmittance (T) again at normal incidence. On comparison of the two results, we noted that the present results are in fact more, closer than those obtained earlier to the corresponding values reported for the bulk cadmium sulfide.

ON THE DETERMINATION OF REFRACTIVE INDEX AND THICKNESS OF THIN DIELECTRIC FILMS FROM MEASUREMENT OF TRANSMITTANCE

2012 ◽  
Vol 19 (06) ◽  
pp. 1250059
Author(s):  
Z. H. SHAH ◽  
I. AHMAD ◽  
Q. A. TAHIR ◽  
E. E. KHAWAJA
Keyword(s):  
Refractive Index ◽  
Normal Incidence ◽  
Dielectric Films ◽  
Refractive Indices ◽  
Transparent Film ◽  
Transparent Substrate ◽  
Thin Dielectric Films

Refractive index and thickness of a transparent film (ZnS) on a transparent substrate (BK-7 glass) have been determined from measurement of normal incidence transmittance, using different methods. Some of the methods considered here are most widely used, as is apparent from the literature. The outcome of this study could help a researcher in selecting an appropriate method for such an application. The values of the refractive indices determined by different methods were found to be close to each other (within 0.5%). However, large (up to 4.4%) differences existed in the values of the thickness determined by different methods.

Measurements of the Refractive Indices of MOCVD and HVPE Grown AlGaN Films Using Prism-Coupling Techniques Correlated with Spectroscopic Reflection/Transmission Analysisa

2002 ◽  
Vol 743 ◽  
Author(s):  
Norman A. Sanford ◽  
Lawrence H. Robins ◽  
Albert V. Davydov ◽  
Alexander J. Shapiro ◽  
Denis V. Tsvetkov ◽  
...  
Keyword(s):  
Refractive Index ◽  
Normal Incidence ◽  
Standard Uncertainty ◽  
Refractive Indices ◽  
Spectroscopy Analysis ◽  
X Ray ◽  
Sapphire Substrates ◽  
Coupling Techniques ◽  
Prism Coupling ◽  
Reflectance Measurements

ABSTRACTWaveguide prism-coupling methods were used to measure the ordinary and extraordinary refractive indices of AlxGa1-xN films grown on sapphire substrates by HVPE and MOCVD. Several discrete wavelengths ranging from 442 nm to 1064 nm were used and the results were fit to one-term Sellmeier equations. The maximum standard uncertainty in the refractive index measurements was ± 0.005 and the maximum standard uncertainty in the self-consistent calculation for film thickness was ± 15 nm. Analysis of normal-incidence spectroscopic transmittance and reflectance measurements, correlated with the prism-coupling results, was used to determine the ordinary refractive index as a continuous function of wavelength from the band gap wavelength of each sample (between 252 nm and 364 nm) to 2500 nm. The Al compositions of the samples were determined using energy-dispersive X-ray spectroscopy analysis (EDS). HVPE grown samples had compositions x = 0.279, 0.363, 0.593, and 0.657. MOCVD samples had x = 0.00, 0.419, 0.507, 0.618, 0.660, and 0.666. The maximum standard uncertainty in the absolute EDS-determined value for x was ± 0.02.

Highly Efficient Solar Energy Conversion Using Graded-index Metamaterial Nanostructured Waveguide

2020 ◽  
Vol 0 (0) ◽  
Author(s):  
Hala J. El-Khozondar ◽  
Rifa J. El-Khozondar ◽  
Abhishek Sharma ◽  
Kawsar Ahmed ◽  
Vigneswaran Dhasarathan
Keyword(s):  
Refractive Index ◽  
Absorption Spectrum ◽  
Solar Cell ◽  
Incident Angle ◽  
Normal Incidence ◽  
Refractive Indices ◽  
Transmission Matrix ◽  
Graded Index ◽  
Transmission Matrix Method ◽  
Tunable Absorption

AbstractIn this paper, a graded-index metamaterial (GIM) nanostructured waveguide is proposed to enhance the performance of solar cells via a tunable absorption spectrum. The proposed four-layer nanostructured waveguide consists of two GIM and SiNx films which are squeezes between glass substrate and air. Using a transmission matrix method, the transmittances as well as the reflectance are calculated for different film thicknesses, refractive indices and incidence angles. We demonstrate that the reflectance is nearly zero where SiNx refractive index is 2.2 in vicinity of 620 nm. As the incident angle increases, the minimum reflectance wavelength blueshifts and slightly increase in the value. In addition, the variation in the minimum reflectance due to a change in the thickness of SiNx layer studied in detail. We show that the absorbance of a solar cell can be easily controlled by varying refractive index and/or thickness of SiNx layer in the proposed nanostructure. The result shows that the best efficiency occurs at normal incidence, n2 = 2.2, and d2 = 30 nm.

Light microscopy of ceramics

1993 ◽  
Vol 51 ◽  
pp. 908-909
Author(s):  
Walter C. McCrone
Keyword(s):  
Refractive Index ◽  
Light Microscopy ◽  
Light Microscope ◽  
Polarized Light ◽  
Refractive Indices ◽  
Complete Coverage ◽  
The Subject ◽  
Lower Refractive Index

An excellent chapter on this subject by V.D. Fréchette appeared in a book edited by L.L. Hench and R.W. Gould in 1971 (1). That chapter with the references cited there provides a very complete coverage of the subject. I will add a more complete coverage of an important polarized light microscope (PLM) technique developed more recently (2). Dispersion staining is based on refractive index and its variation with wavelength (dispersion of index). A particle of, say almandite, a garnet, has refractive indices of nF = 1.789 nm, nD = 1.780 nm and nC = 1.775 nm. A Cargille refractive index liquid having nD = 1.780 nm will have nF = 1.810 and nC = 1.768 nm. Almandite grains will disappear in that liquid when observed with a beam of 589 nm light (D-line), but it will have a lower refractive index than that liquid with 486 nm light (F-line), and a higher index than that liquid with 656 nm light (C-line).

Application of the turbidity ratio method in the spherical particle size determination in the range m ∈ and α ∈

1979 ◽  
Vol 44 (7) ◽  
pp. 2064-2078 ◽  
Author(s):  
Blahoslav Sedláček ◽  
Břetislav Verner ◽  
Miroslav Bárta ◽  
Karel Zimmermann
Keyword(s):  
Refractive Index ◽  
Spherical Particle ◽  
Ratio Method ◽  
Refractive Indices ◽  
Relative Refractive Index ◽  
Particle Size Determination ◽  
The Individual ◽  
The Given ◽  
Turbidity Ratio ◽  
Selection Of

Basic scattering functions were used in a novel calculation of the turbidity ratios for particles having the relative refractive index m = 1.001, 1.005 (0.005) 1.315 and the size α = 0.05 (0.05) 6.00 (0.10) 15.00 (0.50) 70.00 (1.00) 100, where α = πL/λ, L is the diameter of the spherical particle, λ = Λ/μ1 is the wavelength of light in a medium with the refractive index μ1 and Λ is the wavelength of light in vacuo. The data are tabulated for the wavelength λ = 546.1/μw = 409.357 nm, where μw is the refractive index of water. A procedure has been suggested how to extend the applicability of Tables to various refractive indices of the medium and to various turbidity ratios τa/τb obtained with the individual pairs of wavelengths λa and λb. The selection of these pairs is bound to the sequence condition λa = λ0χa and λb = λ0χb, in which b-a = δ = 1, 2, 3; a = -2, -1, 0, 1, 2, ..., b = a + δ = -1, 0, 1, 2, ...; λ0 = λa=0 = 326.675 nm; χ = 546.1 : 435.8 = 1.2531 is the quotient of the given sequence.

Pulsed 157 nm VUV induced refractive index modification of optical fibres and planar fused silica

2002 ◽  
Vol 186 (1-4) ◽  
pp. 583-587 ◽  
Author(s):  
P.E. Dyer ◽  
A.-M. Johnson ◽  
H.V. Snelling ◽  
C.D. Walton
Keyword(s):  
Refractive Index ◽  
Fused Silica ◽  
Optical Fibres

Development of Low-Cost Abbe Refractometer

2018 ◽  
Vol 879 ◽  
pp. 227-233
Author(s):  
Weeratouch Pongruengkiat ◽  
Thitika Jungpanich ◽  
Kodchakorn Ittipornnuson ◽  
Suejit Pechprasarn ◽  
Naphat Albutt
Keyword(s):  
Refractive Index ◽  
Optical Materials ◽  
Low Cost ◽  
Optical Component ◽  
Refractive Indices ◽  
Constant Number ◽  
Optical Wavelength ◽  
Refractive Index Spectrum ◽  
Transparent Polymers ◽  
Abbe Refractometer

Refractive index and Abbe number are major physical properties of optical materials including glasses and transparent polymers. Refractive index is, in fact, not a constant number and is varied as a function of optical wavelength. The full refractive index spectrum can be obtained using a spectrometer. However, for optical component designers, three refractive indices at the wavelengths of 486.1 nm, 589.3 nm and 656.3 nm are usually sufficient for most of the design tasks, since the rest of the spectrum can be predicted by mathematical models and interpolation. In this paper, we propose a simple optical instrumental setup that determines the refractive indices at three wavelengths and the Abbe number of solid and liquid materials.

scholarly journals STUDY OF FILMS OF TRANSITION METALS AS MATERIALS FOR LASER NANOSTRUCTURING

2021 ◽  
Vol 8 ◽  
pp. 241-247
Author(s):  
Roman I. Kuts ◽  
Victor P. Korolkov ◽  
Vladimir N. Khomutov ◽  
Anatoly I. Malyshev ◽  
Sergey L. Mikerin
Keyword(s):  
Thin Films ◽  
Transition Metals ◽  
Fused Silica ◽  
Point Of View ◽  
Direct Laser Writing ◽  
Periodic Nanostructures ◽  
Laser Writing ◽  
Oxide Nanostructures ◽  
Direct Laser ◽  
Silica Substrates

This paper presents the results of a study of direct laser writing on thin films of transition metals (Hf, Ti, Zr, Ta, V). The films were deposited on fused silica substrates. A comparison of laser writing on the indicated films is carried out from the point of view of the presence of contour writing. As it was proved earlier, when writing on zirconium films, contour writing leads to formation of periodic nanostructures with a period equal to the writing step (250-500 nm). Materials were identified that are promising from the point of view of writing oxide nanostructures for the further formation of the diffraction phase microrelief of DOEs.

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