scholarly journals Surface Modification of Polyethersulfone (PES) with UV Photo-Oxidation

Technologies ◽  
2021 ◽  
Vol 9 (2) ◽  
pp. 36
Author(s):  
Ibrahim Cisse ◽  
Sarah Oakes ◽  
Shreen Sachdev ◽  
Marc Toro ◽  
Shin Lutondo ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Contact Angle ◽  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
Water Contact ◽  
X Ray ◽  
Force Microscopy ◽  
Photo Oxidation ◽  
Atomic Force ◽  
Modified Surfaces

Polyethersulfone (PES) films are widely employed in the construction of membranes where there is a desire to make the surface more hydrophilic. Therefore, UV photo-oxidation was studied in order to oxidize the surface of PES and increase hydrophilicity. UV photo-oxidation using low pressure mercury lamps emitting both 253.7 and 184.9 nm radiation were compared with only 253.7 nm photons. The modified surfaces were characterized using X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and water contact angle (WCA) measurements. Both sets of lamps gave similar results, showing an increase of the oxygen concentration up to a saturation level of ca. 29 at.% and a decrease in the WCA, i.e., an increase in hydrophilicity, down to ca. 40°. XPS detected a decrease of sp2 C-C aromatic group bonding and an increase in the formation of C-O, C=O, O=C-O, O=C-OH, O-(C=O)-O, and sulphonate and sulphate moieties. Since little change in surface roughness was observed by AFM, the oxidation of the surface caused the increase in hydrophilicity.

scholarly journals UV Photo-Oxidation of Polybenzimidazole (PBI)

Technologies ◽  
2020 ◽  
Vol 8 (4) ◽  
pp. 52
Author(s):  
Devon Shedden ◽  
Kristen M. Atkinson ◽  
Ibrahim Cisse ◽  
Shin Lutondo ◽  
Tyshawn Roundtree ◽  
...  
Keyword(s):  
Contact Angle ◽  
Photoelectron Spectroscopy ◽  
Treatment Time ◽  
Aerospace Industry ◽  
Water Contact ◽  
X Ray ◽  
Force Microscopy ◽  
Photo Oxidation ◽  
Redox Flow Batteries ◽  
Atomic Force

Since polybenzimidazole (PBI) is often used in the aerospace industry, high-temperature fuel cells, and in redox flow batteries, this research investigated the surface modification of PBI film with 253.7 and 184.9 nm UV photo-oxidation. As observed by X-ray photoelectron spectroscopy (XPS), the oxygen concentration on the surface increased up to a saturation level of 20.2 ± 0.7 at %. With increasing treatment time, there were significant decreases in the concentrations of C-C sp2 and C=N groups and increases in the concentrations of C=O, O-C=O, O-(C=O)-O, C-N, and N-C=O containing moieties due to 253.7 nm photo-oxidation of the aromatic groups of PBI and reaction with ozone produced by 184. 9 nm photo-dissociation of oxygen. Because no significant changes in surface topography were detected by Atomic Force Microscopy (AFM) and SEM measurements, the observed decrease in the water contact angle down to ca. 44°, i.e., increase in hydrophilic, was due to the chemical changes on the surface.

Influence of Thermal Annealing on the Properties of Sputtered Si Rich Silicon Oxide Films

2010 ◽  
Vol 159 ◽  
pp. 101-104
Author(s):  
Emil Manolov ◽  
Mario Curiel ◽  
Nicola Nedev ◽  
Diana Nesheva ◽  
Juan Terrazas ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Refractive Index ◽  
Photoelectron Spectroscopy ◽  
Silicon Oxide ◽  
High Temperature Annealing ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Variable Angle Spectroscopic Ellipsometry

Thin SiOx films deposited by reactive r.f. magnetron sputtering of Si at partial pressure ratios R between oxygen and argon in the range 15%-0.03% are studied. X-ray photoelectron spectroscopy and Variable angle spectroscopic ellipsometry prove enrichment with Si of the layers deposited at R < 0.5 %. Ellipsometric data give information about the refractive index and extinction coefficient of the films. Atomic Force Microscopy results show that for all samples high temperature annealing at 1000oC leads to a decrease of the surface roughness.

Surface Modification of Polyvinylidenefluoride-Trifluoroethylene Film Using Argon Gas Plasma

2012 ◽  
Vol 626 ◽  
pp. 317-323 ◽  
Author(s):  
Rozana Mohd Dahan ◽  
Muhamad Naiman Sarip ◽  
Yap Seong Ling ◽  
Mohamad Hafiz Mohd Wahid ◽  
Adillah Nurashikin Arshad ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Contact Angle ◽  
Photoelectron Spectroscopy ◽  
Argon Plasma ◽  
Water Contact ◽  
Force Microscopy ◽  
Atomic Force ◽  
Gas Plasma ◽  
Good Biocompatibility ◽  
Surface Modified

This study investigates the surface properties of plasma surface modified spin coated PVDF-TrFE (70/30) film using Atomic Force Microscopy (AFM), Water Contact Angle (WCA) and X-ray Photoelectron Spectroscopy (XPS). The surfaces of the spin coated PVDF-TrFE film were modified using 13.56 MHz rf Argon plasma. The exposure time of the charged particle PVDF-TrFE films were varied for 1, 3 and 5mins. Prior to modification, the average surface roughness obtained was 8.615nm, but upon modification, the surface roughness was found to increase to 12.466nm. The value of the contact angle of the modified film was reduced from 90o to 43o and the XPS analysis showed dehydrofluorination of PVDF-TrFE films surfaces. The improved in surface roughness and the increased in wettability of the modified film, resulted in good biocompatibility of the modified PVDF-TrFE thin films. This phenomenon has created interest in researchers for developing functional polymer used for applications in areas such are biomedical, bio-analytical assays, textile and even food industry.

Effect of Surface Chemistry on Ruthenium Wet Etching

2021 ◽  
Vol 314 ◽  
pp. 302-306
Author(s):  
Quoc Toan Le ◽  
E. Kesters ◽  
M. Doms ◽  
Efrain Altamirano Sánchez
Keyword(s):  
Surface Roughness ◽  
Photoelectron Spectroscopy ◽  
Etching Rate ◽  
Wet Etching ◽  
X Ray ◽  
Force Microscopy ◽  
Metal Free ◽  
Atomic Force ◽  
Different Types ◽  
Effect Of Surface

Different types of ALD Ru films, including as-deposited, annealed Ru, without and with a subsequent CMP step, were used for wet etching study. With respect to the as-deposited Ru, the etching rate of the annealed Ru film in metal-free chemical mixtures (pH = 7-9) was found to decrease substantially. X-ray photoelectron spectroscopy characterization indicated that this behavior could be explained by the presence of the formation of RuOx (x = 2,3) caused by the anneal. A short CMP step applied to the annealed Ru wafer removed the surface RuOx, at least partially, resulting in a significant increase of the etching rate. The change in surface roughness was quantified using atomic force microscopy.

Investigation of Ti/CuO interface by X-ray photoelectron spectroscopy and atomic force microscopy

2018 ◽  
Vol 51 (2) ◽  
pp. 246-253
Author(s):  
Dev Raj Chopra ◽  
Justin Seth Pearson ◽  
Darius Durant ◽  
Ritesh Bhakta ◽  
Anil R. Chourasia
Keyword(s):  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Characterization of X-ray irradiated graphene oxide coatings using X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy

2013 ◽  
Vol 28 (2) ◽  
pp. 68-71 ◽  
Author(s):  
Thomas N. Blanton ◽  
Debasis Majumdar
Keyword(s):  
Atomic Force Microscopy ◽  
Graphene Oxide ◽  
Photoelectron Spectroscopy ◽  
High Energy ◽  
X Ray Diffraction ◽  
Carbon Phase ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Before And After

In an effort to study an alternative approach to make graphene from graphene oxide (GO), exposure of GO to high-energy X-ray radiation has been performed. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) have been used to characterize GO before and after irradiation. Results indicate that GO exposed to high-energy radiation is converted to an amorphous carbon phase that is conductive.

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