scholarly journals Biocompatibility of Cyclopropylamine-Based Plasma Polymers Deposited at Sub-Atmospheric Pressure on Poly (ε-caprolactone) Nanofiber Meshes

Nanomaterials ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 1215 ◽  
Author(s):  
Ke Vin Chan ◽  
Mahtab Asadian ◽  
Iuliia Onyshchenko ◽  
Heidi Declercq ◽  
Rino Morent ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atmospheric Pressure ◽  
Cellular Response ◽  
Considerable Effect ◽  
Surface Chemical ◽  
Plasma Exposure ◽  
Plasma Polymers ◽  
X Ray ◽  
Surface Chemical Composition ◽  
Cell Adhesion And Proliferation

In this work, cyclopropylamine (CPA) monomer was plasma-polymerized on poly (ε-caprolactone) nanofiber meshes using various deposition durations to obtain amine-rich surfaces in an effort to improve the cellular response of the meshes. Scanning electron microscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the surface morphology and surface chemical composition of the PCL samples, respectively. The measured coating thickness was found to linearly increase with deposition duration at a deposition rate of 0.465 nm/s. XPS analysis revealed that plasma exposure time had a considerable effect on the surface N/C and O/C ratio as well as on amino grafting efficiency and amino selectivity. In addition, cell studies showed that cell adhesion and proliferation significantly improved for all coated samples.

scholarly journals Applying Cryo-X-ray Photoelectron Spectroscopy to Study the Surface Chemical Composition of Fungi and Viruses

2021 ◽  
Vol 9 ◽  
Author(s):  
Andrey Shchukarev ◽  
Emelie Backman ◽  
Samuel Watts ◽  
Stefan Salentinig ◽  
Constantin F. Urban ◽  
...  
Keyword(s):  
Chemical Composition ◽  
Photoelectron Spectroscopy ◽  
Biological Systems ◽  
Building Blocks ◽  
Model Organisms ◽  
Surface Chemical ◽  
Surface Layers ◽  
Xps Spectra ◽  
X Ray ◽  
Surface Chemical Composition

Interaction between microorganisms and their surroundings are generally mediated via the cell wall or cell envelope. An understanding of the overall chemical composition of these surface layers may give clues on how these interactions occur and suggest mechanisms to manipulate them. This knowledge is key, for instance, in research aiming to reduce colonization of medical devices and device-related infections from different types of microorganisms. In this context, X-ray photoelectron spectroscopy (XPS) is a powerful technique as its analysis depth below 10 nm enables studies of the outermost surface structures of microorganism. Of specific interest for the study of biological systems is cryogenic XPS (cryo-XPS). This technique allows studies of intact fast-frozen hydrated samples without the need for pre-treatment procedures that may cause the cell structure to collapse or change due to the loss of water. Previously, cryo-XPS has been applied to study bacterial and algal surfaces with respect to their composition of lipids, polysaccharides and peptide (protein and/or peptidoglycan). This contribution focuses onto two other groups of microorganisms with widely different architecture and modes of life, namely fungi and viruses. It evaluates to what extent existing models for data treatment of XPS spectra can be applied to understand the chemical composition of their very different surface layers. XPS data from model organisms as well as reference substances representing specific building blocks of their surface were collected and are presented. These results aims to guide future analysis of the surface chemical composition of biological systems.

scholarly journals Surface Chemical Composition of Size-Fractionated Urban Walkway Aerosols Determined by X-Ray Photoelectron Spectroscopy

2013 ◽  
Vol 47 (10) ◽  
pp. 1118-1124 ◽  
Author(s):  
Wenjuan Cheng ◽  
Lu-Tao Weng ◽  
Yongjie Li ◽  
Arthur Lau ◽  
Chak K. Chan ◽  
...  
Keyword(s):  
Chemical Composition ◽  
Photoelectron Spectroscopy ◽  
Surface Chemical ◽  
X Ray ◽  
Surface Chemical Composition

scholarly journals Study of surface chemical composition of oxide nanostructures by X-ray photoelectron spectroscopy

2020 ◽  
Vol 1658 ◽  
pp. 012034
Author(s):  
S S Nalimova ◽  
Z V Shomakhov ◽  
A A Bobkov ◽  
A A Ryabko ◽  
Z Kh Kalazhokov ◽  
...  
Keyword(s):  
Chemical Composition ◽  
Photoelectron Spectroscopy ◽  
Surface Chemical ◽  
X Ray ◽  
Surface Chemical Composition ◽  
Oxide Nanostructures

Controlling Surface Sensitive Processes in Microelectronics Manufacturing to Improve Wire Bonded Joint Reliability

2019 ◽  
Vol 2019 (1) ◽  
pp. 000515-000518
Author(s):  
E.J. Kidd ◽  
Brooke Campbell ◽  
R. Giles Dillingham
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atmospheric Plasma ◽  
Surface Chemical ◽  
X Ray ◽  
Surface Chemical Composition ◽  
Joint Reliability ◽  
Bonded Joint ◽  
Key Players ◽  
Molecular Layers ◽  
Surface Chemistries

Abstract Validating surface chemical composition and properties of die pad surfaces is crucial for achieving joint reliability in microelectronic wire bonding operations. Die pad surfaces undergo a number of surface sensitive manufacturing steps prior to bonding that will affect joint performance; contact and environmental contaminants from process aids, shipping, handling, storage and out time are all key players in surface degradation. Microelectronics manufacturers may implement cleaning and/or surface activation operations to remediate surfaces from upstream contaminants, however, understanding and quantifying the effect of such processes requires the ability to manipulate and monitor the top few molecular layers of a material responsible for adhesion—the surface. This presentation will investigate surface chemistries of atmospheric plasma cleaned and non-cleaned die pad surfaces as determined by X-ray photoelectron spectroscopy (XPS) and surface energy measurements via contact angle techniques.

X-ray Photoelectron Spectroscopy for Wheat Powders: Measurement of Surface Chemical Composition

2011 ◽  
Vol 59 (5) ◽  
pp. 1527-1540 ◽  
Author(s):  
Moustafa Saad ◽  
Claire Gaiani ◽  
Martine Mullet ◽  
Joel Scher ◽  
Bernard Cuq
Keyword(s):  
Chemical Composition ◽  
Photoelectron Spectroscopy ◽  
Surface Chemical ◽  
X Ray ◽  
Surface Chemical Composition

Argon Plasma Induced Surface Modifications For Resistless Patterning Of Aluminium Films

1991 ◽  
Vol 223 ◽  
Author(s):  
Neeta Agrawal ◽  
R. D. Tarey ◽  
K. L. Chopra
Keyword(s):  
Etch Rate ◽  
Argon Plasma ◽  
Surface Modifications ◽  
Surface Chemical ◽  
Plasma Exposure ◽  
X Ray ◽  
Aluminium Fluoride ◽  
A New Technique ◽  
Plasma Exposure Time ◽  
Surface Chemical Modification

ABSTRACTArgon plasma exposure has been used to induce surface chemical modification of aluminium thin films, causing a drastic change in etch rate in standard HNO3/CH3COOH/H3PO4 etchant. The inhibition period was found to increase with power and Ar plasma exposure time. Auger electron and x-ray photoelectron spectroscopies have indicated formation of an aluminium fluoride (AlF3) surface layer due to fluorine contamination originating from the residue left in the plasma chamber during CF4 processing. The high etch selectivity between unexposed and argon plasma exposed regions has been exploited as a new technique for resistless patterning of aluminium.

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