scholarly journals Methodological Consideration on the Prediction of Electrochemical Mechanical Polishing Process Parameters by Monitoring of Electrochemical Characteristics of Copper Surface

Author(s):  
Yong-Jin Seo
2011 ◽  
Vol 314-316 ◽  
pp. 1846-1850 ◽  
Author(s):  
Shuai Guo ◽  
Z.N Guo ◽  
Hong Ping Luo ◽  
Wen Cai Gu

The mechanism of the elctrochemical mechanical polishing (ECMP) technology for micro tool electrode was investigated. In this paper, suitable major process parameters on the surface quality were evaluated, the major parameters contains electrical parameters, machining gap, the working fluid and other factors. In quantitative analyses, the process of the ECMP technology were conducted. The roughness of the workpiece was reduced from a relatively high value to a mirror effect.


2010 ◽  
Vol 27 (1) ◽  
pp. 310-314 ◽  
Author(s):  
Nadiia Kulyk ◽  
Chang Yong An ◽  
Jung Hoon Oh ◽  
Sung Min Cho ◽  
Changsup Ryu ◽  
...  

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