On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes
2020 ◽
Vol 59
(SJ)
◽
pp. SJJC01
◽
Keyword(s):
2000 ◽
Vol 11
(12)
◽
pp. 1726-1731
◽
2008 ◽
Vol 47
(8)
◽
pp. 6900-6902
◽
Keyword(s):
1992 ◽
Vol 25
(4)
◽
pp. 620-633
◽
2014 ◽
Vol 42
(7)
◽
pp. 1880-1893
◽
2017 ◽
Vol 50
(13)
◽
pp. 135203
◽
Keyword(s):