Effects of RF Magnetron Sputtering Power on Structure and Properties of the Optical Vanadium Oxide Films

2015 ◽  
Vol 42 (8) ◽  
pp. 0807001
Author(s):  
张建鹏 Zhang Jianpeng ◽  
黄美东 Huang Meidong ◽  
李园 Li Yuan ◽  
杨明敏 Yang Mingmin ◽  
张鹏宇 Zhang Pengyu
Keyword(s):  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Structure And Properties ◽  
Sputtering Power ◽  
Vanadium Oxide Films

Gallium oxide films deposition by RF magnetron sputtering; a detailed analysis on the effects of deposition pressure and sputtering power and annealing

2021 ◽  
Vol 47 (2) ◽  
pp. 1721-1727
Author(s):  
Soheil Mobtakeri ◽  
Yunus Akaltun ◽  
Ali Özer ◽  
Merhan Kılıç ◽  
Ebru Şenadım Tüzemen ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Detailed Analysis ◽  
Gallium Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Deposition Pressure ◽  
Sputtering Power

Reactive DC Magnetron Sputtering of Vanadium Oxide Thin Films

2008 ◽  
Vol 587-588 ◽  
pp. 343-347 ◽  
Author(s):  
C. Batista ◽  
J. Mendes ◽  
Vasco Teixeira ◽  
Joaquim Carneiro
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Single Phase ◽  
Oxide Films ◽  
Wide Field ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Vanadium Oxide Thin Films ◽  
Vanadium Oxide Films

Vanadium oxides are a class of materials with outstanding physical and chemical properties. They find a wide field of technological applications such as optical and electrical switching devices, light detectors, temperature sensors, micro batteries, etc. There are several studies regarding the production of vanadium oxide films by radio-frequency (RF) magnetron sputtering, and with increasing interest on the thermochromic VO2 phase. However, literature with focus on vanadium oxide films deposited by direct current (DC) magnetron sputtering is very limited. In this work, we have successfully deposited vanadium oxide thin films by reactive DC magnetron sputtering under several processing conditions. The effect of substrate type, temperature, and O2/Ar flow ratio on phase formation has been studied. Structural analysis and phase determination have been carried out by X-ray diffractometry (XRD). Some single phase samples were also analysed with respect to surface morphology by means of scanning electron microscopy (SEM) and atomic force microscopy (AFM). The thermochromic behaviour of single phase VO2(M) films has been evaluated by optical spectrophotometry.

scholarly journals Thermochromic properties of vanadium oxide films prepared by dc reactive magnetron sputtering

2008 ◽  
Vol 516 (7) ◽  
pp. 1484-1488 ◽  
Author(s):  
Hai-Ning Cui ◽  
Vasco Teixeira ◽  
Li-Jian Meng ◽  
Rong Wang ◽  
Jin-Yue Gao ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Oxide Films ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering ◽  
Thermochromic Properties ◽  
Vanadium Oxide Films

Effect of Annealing Oxygen Flow Rate on the Properties of Vanadium Oxide Films Deposited by Reactive Magnetron Sputtering

2014 ◽  
Vol 936 ◽  
pp. 651-655
Author(s):  
Hua Fu Zhang ◽  
Zhi Ming Wu ◽  
Xue Fei Wu ◽  
Ya Dong Jiang
Keyword(s):  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Thermal Hysteresis ◽  
Oxide Films ◽  
Oxygen Flow ◽  
Pure Oxygen ◽  
Oxide Glass ◽  
Flow Rates ◽  
Deposited Films ◽  
Vanadium Oxide Films

Vanadium oxide films were prepared on indium-tin oxide glass substrates at low temperature by means of reactive direct current magnetron sputtering and subsequent in-situ annealing process in pure oxygen ambient. In the process of annealing, the oxygen flow rates were varied from 0 to 15 SCCM in order to investigate the effect of annealing oxygen flow rates on the properties of the deposited films. The experimental results indicate that only the vanadium oxide films annealed under relatively high oxygen flow rates (≥ 0.8 SCCM) displayed insulator-metal transition. In addition, it was found that vanadium valence states, surface morphology, optical transmittance and phase transition temperature of the deposited films were sensitive to the annealing oxygen flow rates while the width of thermal hysteresis was relatively insensitive to the annealing oxygen flow rates.

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