Low-temperature, rapid thermal annealing of CIS thin films deposited by using a co-sputtering process with in and CuSe2 targets

2015 ◽  
Vol 66 (6) ◽  
pp. 1001-1008 ◽  
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Nam-Hoon Kim ◽  
Back-Sub Sung ◽  
Young-Kil Jun ◽  
Dong Hyun Chung ◽  
Woo-Sun Lee
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Author(s):  
M. Mizuguchi ◽  
T. Sakurada ◽  
T. Y. Tashiro ◽  
K. Sato ◽  
T. J. Konno ◽  
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1999 ◽  
Vol 25 (1-4) ◽  
pp. 195-203 ◽  
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Masashi Shoyama ◽  
Akihiro Tsuzuki ◽  
Kazumi Kato ◽  
Norimitsu Murayama

1989 ◽  
Vol 65 (5) ◽  
pp. 2069-2072 ◽  
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R. Kakkad ◽  
J. Smith ◽  
W. S. Lau ◽  
S. J. Fonash ◽  
R. Kerns

1985 ◽  
Vol 47 (10) ◽  
pp. 1080-1082 ◽  
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L. J. Brillson ◽  
M. L. Slade ◽  
H. W. Richter ◽  
H. Vander Plas ◽  
R. T. Fulks

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