Electrical properties of Ga-implanted Si p/sup +/-n shallow junctions fabricated by low-temperature rapid thermal annealing

1988 ◽  
Vol 9 (11) ◽  
pp. 594-597 ◽  
Author(s):  
C.-M. Lin ◽  
A.J. Steckl ◽  
T.P. Chow
Keyword(s):  
Electrical Properties ◽  
Low Temperature ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Shallow Junctions ◽  
Temperature Rapid Thermal Annealing

scholarly journals Fabrication of highly L10-ordered FePt thin films by low-temperature rapid thermal annealing

APL Materials ◽  
2013 ◽  
Vol 1 (3) ◽  
pp. 032117 ◽  
Author(s):  
M. Mizuguchi ◽  
T. Sakurada ◽  
T. Y. Tashiro ◽  
K. Sato ◽  
T. J. Konno ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Temperature Rapid Thermal Annealing ◽  
Fept Thin Films

Crystallized Si films by low‐temperature rapid thermal annealing of amorphous silicon

1989 ◽  
Vol 65 (5) ◽  
pp. 2069-2072 ◽  
Author(s):  
R. Kakkad ◽  
J. Smith ◽  
W. S. Lau ◽  
S. J. Fonash ◽  
R. Kerns
Keyword(s):  
Low Temperature ◽  
Amorphous Silicon ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Temperature Rapid Thermal Annealing ◽  
Si Films
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