Titanium–silicon and silicon dioxide reactions controlled by low temperature rapid thermal annealing

1986 ◽  
Vol 4 (3) ◽  
pp. 993-997 ◽  
Author(s):  
L. J. Brillson ◽  
M. L. Slade ◽  
H. W. Richter ◽  
H. VanderPlas ◽  
R. T. Fulks
Keyword(s):  
Low Temperature ◽  
Silicon Dioxide ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Temperature Rapid Thermal Annealing ◽  
Titanium Silicon

Control of titanium‐silicon and silicon dioxide reactions by low‐temperature rapid thermal annealing

1985 ◽  
Vol 47 (10) ◽  
pp. 1080-1082 ◽  
Author(s):  
L. J. Brillson ◽  
M. L. Slade ◽  
H. W. Richter ◽  
H. Vander Plas ◽  
R. T. Fulks
Keyword(s):  
Low Temperature ◽  
Silicon Dioxide ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Temperature Rapid Thermal Annealing ◽  
Titanium Silicon

scholarly journals Fabrication of highly L10-ordered FePt thin films by low-temperature rapid thermal annealing

APL Materials ◽  
2013 ◽  
Vol 1 (3) ◽  
pp. 032117 ◽  
Author(s):  
M. Mizuguchi ◽  
T. Sakurada ◽  
T. Y. Tashiro ◽  
K. Sato ◽  
T. J. Konno ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Temperature Rapid Thermal Annealing ◽  
Fept Thin Films

Crystallized Si films by low‐temperature rapid thermal annealing of amorphous silicon

1989 ◽  
Vol 65 (5) ◽  
pp. 2069-2072 ◽  
Author(s):  
R. Kakkad ◽  
J. Smith ◽  
W. S. Lau ◽  
S. J. Fonash ◽  
R. Kerns
Keyword(s):  
Low Temperature ◽  
Amorphous Silicon ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Temperature Rapid Thermal Annealing ◽  
Si Films
Sign in / Sign up

Export Citation Format

Share Document