Evaluation of the Instrument Resolution Effect for Various Neutron Reflectivity Measurement Methods

2013 ◽  
Vol 63 (7) ◽  
pp. 783-793
Author(s):  
Jeong Soo LEE*
Keyword(s):  
Measurement Methods ◽  
Neutron Reflectivity ◽  
Reflectivity Measurement ◽  
Instrument Resolution

scholarly journals Kinetics of silver photodiffusion into amorphous S-rich germanium sulphide – neutron and optical reflectivity

2019 ◽  
Vol 91 (11) ◽  
pp. 1821-1835 ◽  
Author(s):  
Yoshifumi Sakaguchi ◽  
Hidehito Asaoka ◽  
Maria Mitkova
Keyword(s):  
Reaction Layer ◽  
Electronic Band Structure ◽  
Light Exposure ◽  
Neutron Reflectivity ◽  
Electronic Band ◽  
Reflectivity Measurement ◽  
Optical Reflectivity ◽  
Amorphous Chalcogenides ◽  
Induced Changes ◽  
Kinetics Of

Abstract Silver photodiffusion is one of the attractive photo-induced changes observed in amorphous chalcogenides. In this research, we focus on amorphous S-rich germanium sulphide and study the kinetics of the silver photodiffusion by neutron reflectivity, as well as optical reflectivity. It was found from the neutron reflectivity profiles with 30 s time resolution that silver dissolved into the germanium sulphide layer, forming a metastable reaction layer between the Ag and the germanium sulphide layers, within 2 min of light exposure. Subsequently, silver slowly diffused from the metastable reaction layer to the germanium sulphide host layer until the Ag concentration in both layers became identical, effectively forming one uniform layer; this took approximately 20 min. Optical reflectivity reveals the electronic band structure of the sample, complementary to neutron reflectivity. It was found from the optical reflectivity measurement that the metastable reaction layer was a metallic product. The product could be Ag8GeS6-like form, which is regarded as the combination of GeS2 and Ag2S, and whose backbone is composed of the GeS4 tetrahedral units and the S atoms. We attribute the first quick diffusion to the capture of Ag ions by the latter S atoms, which is realised by the S–S bond in amorphous S-rich germanium sulphide, while we attribute the second slow diffusion to the formation of the Ag–Ge–S network, in which Ag ions are captured by the former GeS4 tetrahedral units.

Neutron Reflectivity Measurement of Polymer Monolayer and Brush at the Air/Water Interface

hamon ◽  
2009 ◽  
Vol 19 (4) ◽  
pp. 234-237
Author(s):  
Emiko Mouri ◽  
Hideki Matsuoka
Keyword(s):  
Neutron Reflectivity ◽  
Water Interface ◽  
Reflectivity Measurement ◽  
Air Water Interface

Recent Microwave Absorber Wall-Reflectivity Measurement Methods [Measurements Corner]

2008 ◽  
Vol 50 (2) ◽  
pp. 140-147 ◽  
Author(s):  
Brian E. Fischer ◽  
Ivan J. Lahaie
Keyword(s):  
Measurement Methods ◽  
Microwave Absorber ◽  
Reflectivity Measurement

scholarly journals Neutron Reflectivity Measurement

hamon ◽  
2009 ◽  
Vol 19 (1) ◽  
pp. 34-40
Author(s):  
Dai Yamazaki ◽  
Masahiro Hino
Keyword(s):  
Neutron Reflectivity ◽  
Reflectivity Measurement

Fabry-Perot effects in the exponential decay and phase shift reflectivity measurement methods

1991 ◽  
Vol 30 (3) ◽  
pp. 344 ◽  
Author(s):  
Michel Billardon ◽  
Marie Emmanuelle Couprie ◽  
Jean Michel Ortega ◽  
Michel Velghe
Keyword(s):  
Phase Shift ◽  
Exponential Decay ◽  
Measurement Methods ◽  
Reflectivity Measurement ◽  
Fabry Perot

scholarly journals Neutron reflectivity measurement of protein A–antibody complex at the solid-liquid interface

2017 ◽  
Vol 1499 ◽  
pp. 118-131 ◽  
Author(s):  
Alice R. Mazzer ◽  
Luke A. Clifton ◽  
Tatiana Perevozchikova ◽  
Paul D. Butler ◽  
Christopher J. Roberts ◽  
...  
Keyword(s):  
Protein A ◽  
Liquid Interface ◽  
Neutron Reflectivity ◽  
Reflectivity Measurement ◽  
Antibody Complex ◽  
Solid Liquid Interface ◽  
Solid Liquid

Resolution, Contrast and Interpretation of HVEM Images of Crystals

1973 ◽  
Vol 31 ◽  
pp. 228-229
Author(s):  
L. E. Thomas ◽  
J. S. Lally ◽  
R. M. Fisher
Keyword(s):  
High Voltage ◽  
Chromatic Aberration ◽  
Crystalline Materials ◽  
Resolution Parameter ◽  
Instrument Resolution ◽  
Imaging Conditions ◽  
Beam Excitation ◽  
Optimum Imaging

In addition to improved penetration at high voltage, the characteristics of HVEM images of crystalline materials are changed markedly as a result of many-beam excitation effects. This leads to changes in optimum imaging conditions for dislocations, planar faults, precipitates and other features.Resolution - Because of longer focal lengths and correspondingly larger aberrations, the usual instrument resolution parameter, CS174 λ 374 changes by only a factor of 2 from 100 kV to 1 MV. Since 90% of this change occurs below 500 kV any improvement in “classical” resolution in the MVEM is insignificant. However, as is widely recognized, an improvement in resolution for “thick” specimens (i.e. more than 1000 Å) due to reduced chromatic aberration is very large.

Resolution and measurement in the scanning electron microscope

1987 ◽  
Vol 45 ◽  
pp. 534-537 ◽  
Author(s):  
Michael T. Postek
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Engineering Design ◽  
Resolving Power ◽  
Practical Applications ◽  
Instrument Resolution ◽  
Accurate Definition ◽  
Definition Of ◽  
Scanning Electron ◽  
Better Than

The term ultimate resolution or resolving power is the very best performance that can be obtained from a scanning electron microscope (SEM) given the optimum instrumental conditions and sample. However, as it relates to SEM users, the conventional definitions of this figure are ambiguous. The numbers quoted for the resolution of an instrument are not only theoretically derived, but are also verified through the direct measurement of images on micrographs. However, the samples commonly used for this purpose are specifically optimized for the measurement of instrument resolution and are most often not typical of the sample used in practical applications.SEM RESOLUTION. Some instruments resolve better than others either due to engineering design or other reasons. There is no definitively accurate definition of how to quantify instrument resolution and its measurement in the SEM.

A critical comparison of selected implicit measurement methods.

2018 ◽  
Vol 11 (4) ◽  
pp. 249-266 ◽  
Author(s):  
Judith Znanewitz ◽  
Lisa Braun ◽  
David Hensel ◽  
Claudia Fantapié Altobelli ◽  
Fabian Hattke
Keyword(s):  
Measurement Methods ◽  
Critical Comparison ◽  
Implicit Measurement
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