Stabilization of Nano-Al2O3p/Cu Composite after High Temperature Annealing Treatment

2005 ◽  
pp. 993-996
Author(s):  
Ke Xing Song ◽  
Ping Liu ◽  
Bao Hong Tian ◽  
Qi Ming Dong ◽  
Jian Dong Xing
2009 ◽  
Vol 58 (5) ◽  
pp. 3274
Author(s):  
Peng Xian-De ◽  
Zhu Tao ◽  
Wang Fang-Wei

2012 ◽  
Vol 496 ◽  
pp. 79-83
Author(s):  
Jun Wei Zhao ◽  
Tie Kun Jia ◽  
Xiang Gui Kong

The pure β-NaYF4: Yb3+, Er3+ hexagonal sub-microplates were successfully prepared by the combination of coprecipitation and hydrothermal methods using sodium citrate as chelator. The size of them is about 600 nm × 400 nm (side length × thickness). The obtained sample was divided into two parts and one of them was annealed in nitrogen at 300 °C for 2 hours. The crystal structure of the β-NaYF4: Yb3+, Er3+ hexagonal sub-microplates before and after annealing treatment is hexagonal phase. Under the excitation of 980 nm diode laser, the upconversion luminescence intensity the sample after annealing is much stronger than that of the sample without annealing treatment. High temperature annealing process improved the crystallization of the sample, resulting in the decrease of the nonradiative relaxation and the enhancement of the upconversion luminescence.


2005 ◽  
Vol 475-479 ◽  
pp. 993-996 ◽  
Author(s):  
Ke Xing Song ◽  
Ping Liu ◽  
Bao Hong Tian ◽  
Qi Ming Dong ◽  
Jian Dong Xing

Al2O3 dispersion strengthened copper composite (Al2O3p/Cu composite) was produced by internal oxidation. The hardness and electrical conductivity of the produced Al2O3p/Cu composite (0.60 wt.% Al2O3) subjected to high temperature annealing treatments after different cold work deformations have been investigated; the microstructures of the composite have also been analyzed by TEM. Results show that the microstructure of the composite is characterized by an uniform distribution of nano-Al2O3 particles in Cu-matrix; the composite can maintain more than 91% hardness retention after 1h, 1000°C annealing treatment; the recrystallization of the Cu-matrix can be largely retarded and only partially happened even annealing for 1h at 1050°C, following cold deformation of 84%.


Author(s):  
P. Roitman ◽  
B. Cordts ◽  
S. Visitserngtrakul ◽  
S.J. Krause

Synthesis of a thin, buried dielectric layer to form a silicon-on-insulator (SOI) material by high dose oxygen implantation (SIMOX – Separation by IMplanted Oxygen) is becoming an important technology due to the advent of high current (200 mA) oxygen implanters. Recently, reductions in defect densities from 109 cm−2 down to 107 cm−2 or less have been reported. They were achieved with a final high temperature annealing step (1300°C – 1400°C) in conjunction with: a) high temperature implantation or; b) channeling implantation or; c) multiple cycle implantation. However, the processes and conditions for reduction and elimination of precipitates and defects during high temperature annealing are not well understood. In this work we have studied the effect of annealing temperature on defect and precipitate reduction for SIMOX samples which were processed first with high temperature, high current implantation followed by high temperature annealing.


Alloy Digest ◽  
1993 ◽  
Vol 42 (4) ◽  

Abstract Ferroperm is a soft magnetic alloy that contains 1% aluminum. This addition of aluminum combined with high-temperature annealing increases permeability and reduces coercivity without decreasing the high-saturation magnetization of pure iron. This datasheet provides information on composition, physical properties, elasticity, and tensile properties as well as fracture toughness. It also includes information on forming. Filing Code: FE-99. Producer or source: NKK Corporation.


2018 ◽  
Vol 42 (1) ◽  
pp. 149-158
Author(s):  
SHUANG XI ◽  
SHUANGSHUANG ZUO ◽  
YING LIU ◽  
YINLONG ZHU ◽  
YUTU YANG ◽  
...  

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