Morphological Characterization of Fabricated Aluminum Interdigitated Electrodes on Silicon Substrate

2015 ◽  
Vol 1109 ◽  
pp. 381-384
Author(s):  
M. Safwan Azmi ◽  
Sharipah Nadzirah ◽  
Uda Hashim
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Silicon Substrate ◽  
Morphological Characterization ◽  
Interdigitated Electrodes ◽  
Photolithography Process ◽  
Scanning Electron

The purpose of this paper is to study the morphological characterization of aluminum interdigitated electrodes (IDE) of different gap sizes on silicon substrate. The electrodes were fabricated using standard photolithography process and were done so with sizes of 12 μm, 10 μm and 7 μm. The electrodes were morphologically characterized using scanning electron microscope (SEM) and high-powered microscope (HPM).Keywords: morphological, interdigitated electrodes, aluminum

scholarly journals Morphological Characterization of the Polyflux 210H Hemodialysis Filter Pores

2012 ◽  
Vol 2012 ◽  
pp. 1-6 ◽  
Author(s):  
A. Hedayat ◽  
J. Szpunar ◽  
N. A. P. Kiran Kumar ◽  
R. Peace ◽  
H. Elmoselhi ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Morphological Characterization ◽  
Channel Structure ◽  
Maximum Diameter ◽  
Membrane Pore ◽  
Middle Molecules ◽  
Scanning Electron ◽  
Inner Pore

Background. Morphological characterization of hemodialysis membranes is necessary to improve pore design.Aim. To delineate membrane pore structure of a high flux filter, Polyflux 210H.Methods. We used a Joel JSM-6010LV scanning electron microscope (SEM) and a SU6600 Hitachi field emission scanning electron microscope (FESEM) to characterize the pore and fiber morphology. The maximal diameters of selected uremic toxins were calculated using the macromolecular modeling Crystallographic Object-Oriented Toolkit (COOT) software.Results. The mean pore densities on the outermost and innermost surfaces of the membrane were 36.81% and 5.45%, respectively. The membrane exhibited a tortuous structure with poor connection between the inner and outer pores. The aperture’s width in the inner surface ranged between 34 and 45 nm, which is 8.76–11.60 times larger than the estimated maximum diameter ofβ2-microglobulin (3.88 nm).Conclusion. The results suggest that the diameter size of inner pore apertures is not a limiting factor to middle molecules clearance, the extremely diminished density is. Increasing inner pore density and improving channel structure are strategies to improve clearance of middle molecules.

scholarly journals Morphological Characterization of Bacteria Using the Atmospheric Scanning Electron Microscope (ASEM)

2010 ◽  
Vol 16 (S2) ◽  
pp. 50-51
Author(s):  
K Teramoto ◽  
H Nishiyama ◽  
Y Maruyama ◽  
Y Konyuuba ◽  
Y Abe ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Morphological Characterization ◽  
Scanning Electron

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

scholarly journals Morphological Characterization of Soot from the Atmospheric Combustion of Kerosene

2011 ◽  
Vol 8 (3) ◽  
pp. 1068-1073 ◽  
Author(s):  
Ezekiel Dixon Dikio
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Morphological Characterization ◽  
Catalyst Precursor ◽  
Carbon Nanomaterial ◽  
X Ray Diffraction ◽  
Carbon Nanospheres ◽  
X Ray ◽  
Scanning Electron

Kerosene has been used as a precursor for the production of carbon nanomaterial without a catalyst precursor. Nanomaterials formed in the process have been analysed by Raman, Scanning electron microscope (SEM), x-Ray diffraction (XRD) and by Energy dispersive spectroscopy (EDS). Carbon nanomaterial produced show the morphology of carbon nanospheres with diameters of about 0.3 µm.

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

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