Effect of Praseodymium Salt on Properties of Anodic Aluminum Oxide Films

2011 ◽  
Vol 399-401 ◽  
pp. 847-850 ◽  
Author(s):  
Xiao Zhen Liu ◽  
Zhao Xin Liu ◽  
Ai Bing Yu ◽  
Gang Wang ◽  
Ling Ling Song ◽  
...  

Praseodymium salt was used as additives for the first time in preparing anodic aluminum oxide (AAO) films to improve its performance. AAO films were prepared by anodization method from a 15 vol.% sulphuric acid solution containing praseodymium salt. The effects of Pr concentration on microhardness and thickness of AAO film were investigated, respectively. The effect of heat treatment temperature on structure of AAO film was investigated. AAO films were characterized by XRD, EDAX and SEM techniques. AAO films showed higher microhardness and thickness, the surface of AAO film was smoother and the aperture of AAO film was more uniform than those of films prepared in 15 vol. % sulphuric acid anodization solution. The microhardness and thickness of AAO film were 355.7HV and 84μm respectively. The apertures of AAO film were in 25~30nm. There was not praseodymium in AAO film. AAO films were amorphous when heat treatment temperatures of AAO film were below 800°C. When heat treatment temperature of AAO film were 850°C and 1000°C respectively, AAO films were γ-Al2O3 and α-Al2O3 film respectively.

2011 ◽  
Vol 413 ◽  
pp. 300-303
Author(s):  
Xiao Zhen Liu ◽  
Liang Wei Zhu ◽  
Gang Wang ◽  
Ling Ling Song ◽  
Xiao Yun Tang

Erbium salt was used as additives for the first time in preparing anodic aluminum oxide (AAO) films to improve its performance. AAO films were prepared from a 15 vol. % sulphuric acid solution containing erbium salt by anodization method; the effects of concentration of erbium on microhardness and thickness of AAO film were researched, respectively. The effect of heat treatment temperature on structure of AAO film was researched. AAO films were characterized by XRD, EDAX and SEM techniques, respectively. The microhardness and thickness of AAO film were 378.5HV and 82μm respectively, which were higher 12.99% and 17.14% than those of the film prepared in electrolyte of nothing addition erbium salt respectively. The aperture of AAO film was more uniform and the surface of AAO film was smoother than those of films prepared in electrolyte of nothing addition erbium salt. The apertures of AAO film were in 25~30nm. There was not erbium in AAO film. AAO films were amorphous when heat treatment temperatures of AAO film were below 800°C, when heat treatment temperature of AAO film were 850°C and 1000°C respectively, and AAO films were γ-Al2O3and α-Al2O3film respectively.


2011 ◽  
Vol 415-417 ◽  
pp. 1895-1898 ◽  
Author(s):  
Xiao Zhen Liu ◽  
Jian Qiang Gen ◽  
Ai Bing Yu ◽  
Gang Wang ◽  
Ling Ling Song ◽  
...  

Neodymium salt was used as additives for the first time in preparing anodic aluminum oxide (AAO) films to improve its performance. AAO films were prepared by anodization method from a 15 vol. % sulphuric acid solution containing neodymium salt; the effects of concentration of neodymium on microhardness and thickness of AAO film were researched, respectively. The effect of heat treatment temperature on structure of AAO film was researched. AAO films were characterized by XRD, EDAX and SEM techniques. The microhardness and thickness of AAO film were 377.2HV and 85μm respectively, which were higher 12.60% and 21.43% than those of the film prepared in electrolyte of nothing addition neodymium salt, respectively. The surface of AAO film was smoother and the aperture of AAO film was more uniform than those of films prepared in electrolyte of nothing addition neodymium salt. The apertures of AAO film were in 25~30nm. There was not neodymium in AAO film. AAO films were amorphous when heat treatment temperatures of AAO film were below 800°C, heat treatment temperature of AAO film were 850°C and 1000°C respectively, AAO films were γ-Al2O3and α-Al2O3film respectively.


2014 ◽  
Vol 577 ◽  
pp. 11-14
Author(s):  
Xiao Zhen Liu ◽  
Xiao Hui Yan ◽  
Gang Wang ◽  
Xiao Zhou Liu ◽  
Jie Chen ◽  
...  

The anodic aluminum oxide (AAO) films were prepared by anodization method from the 15 vol. % sulphuric acid solution, and prepared AAO films were heat-treated in the ranges of 25~1000°C. AAO films were characterized by EDAX, SEM and XRD techniques, respectively. The crystal phases of prepared AAO film is amorphous. The apertures of AAO film are in 25~30 nm. AAO films are amorphous when heat treatment temperatures of AAO films are below 800 °C. After the AAO film being heat-treated in the ranges of 850°C~900 °C, the heat-treated AAO film are γ-Al2O3film. When the AAO film is heat-treated at 950 °C, the part of γ-Al2O3change into α-Al2O3, and the heat-treated AAO film are mixed film of γ-Al2O3and α-Al2O3. After the AAO film being heat-treated at 1000 °C, the heat-treated AAO film is α-Al2O3film.


2006 ◽  
Vol 317-318 ◽  
pp. 323-326 ◽  
Author(s):  
D.J. Park ◽  
S.H. Kim ◽  
J.H. Lee ◽  
Seong Hee Lee ◽  
Yong Ho Choa

Anodic aluminum oxide (AAO) was prepared in three types of aqueous solutions with various applied voltage. The mechanical property of AAO prepared in different electrolyte was investigated and hardness was increased on account of the increase of the thickness between pores. The mechanical property and microstructure change of AAO prepared in oxalic acid at 40V was investigated by heat treatment. AAO prepared in oxalic acid at 40V was transformed from amorphous to crystalline phase by heat treatment above 800oC and hardness was increased about 2.6 times with increase of heat treatment temperature.


2012 ◽  
Vol 164 ◽  
pp. 223-226
Author(s):  
Xiao Zhen Liu ◽  
Jun Hua Yang ◽  
Gang Wang ◽  
Ling Ling Song ◽  
Ge Shi Zhuang

Neodymium salt was used as additives in preparing anodic aluminum oxide (AAO) films to improve its performance. AAO films were prepared by anodization method from a 15 vol. % sulphuric acid solution containing neodymium salt. The effects of anodization voltage, anodization temperature and anodization time on microhardness and thickness of AAO films were researched, respectively. The thickness of AAO film increases with the increase of anodization voltage, the microhardness of AAO film decreases with the increase of anodization voltage in 19 V~23 V. The thickness of AAO film increases with the increase of anodization temperature, the microhardness of AAO film decreases with the increase of anodization temperature in 11 °C~19°C. The thickness of AAO film increases with the increase of anodization time, the microhardness of AAO film decreases with the increase of anodization time in 30 min~3 h. When the anodizing parameters: anodization voltage: 22 V, temperature: 15°C, anodization time: 2 h, the thickness and microhardness of AAO film is as high as 135μm and 305.4 HV.


Coatings ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 103 ◽  
Author(s):  
Jongho So ◽  
Eunmi Choi ◽  
Jin-Tae Kim ◽  
Jae-Soo Shin ◽  
Je-Boem Song ◽  
...  

The parts of equipment in a process chamber for semiconductors are protected with an anodic aluminum-oxide (AAO) film to prevent plasma corrosion. We added cerium(IV) ions to sulfuric acid in the anodizing of an AAO film to improve the plasma corrosion resistance, and confirmed that the AAO film thickness increased by up to ~20% when using 3 mM cerium(IV) ions compared with general anodizing. The α-Al2O3 phase increased with increasing cerium(IV) ion concentration. The breakdown voltage and etching rate improved to ~35% and 40%, respectively. The film’s performance regarding the generation of contamination particles reduced by ~50%.


1990 ◽  
Vol 202 ◽  
Author(s):  
S. Berger ◽  
Y. Komem ◽  
B. Z. Weiss

ABSTRACTThe effect of heat treatments on the microstrueture, composition and electrical properties of the Al/TiW/ Polycrystal1ine Si system was studied systematically for the first time. It was found that Al and Si diffuse through the grain boundaries of the TiW layer at 400°C. Subsequently, Si accumulates at the Al/TiW interface while Al diffuses into the po1ycrystal1ine Si. TiSi, TiSi2, Al3Ti, and WAl10 are formed only at the Al/TiW interface as a result of the heat-treatments for 30min at temperatures between 450 and 500°C. The sheet resistance, measured on the surface of the Al film, is constant up to 350°C and then increases with the heat treatment temperature at all times. The I–V curves are characteristic to Schottky diodes. The general dependece of the current on the applied voltage remains the same but the electrical resistance changes as a result of the heat-treatments. At the long annealing time(30min), the electrical resistance decreases with the heat-treatment temperature. However, at the short annealing times(10–60sec), it first incrsases(between 400 and 450°C) and then decreases (between 450 and 500°C). The results of the electrical measurements are correlated to the microstructural and compositional changes occured due to the heat treatments.


2021 ◽  
Vol 57 (2) ◽  
pp. 213-218
Author(s):  
I. V. Belyaev ◽  
A. A. Pavlov ◽  
V. E. Bazhenov ◽  
A. A. Stepnov ◽  
A. V. Kireev

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