Curing Kinetics of Silicone Epoxy Resin Containing Fluorene
2014 ◽
Vol 936
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pp. 28-33
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Keyword(s):
1H Nmr
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A new epoxy resin based on dichlorosilane and 9,9-bis (4-hydroxyphenyl) fluorene was synthesized to produce a highly heat-resistant network. The chemical structure was characterized with FTIR spectroscopy and 1H-NMR. 4-4′-Diaminodiphenylsulfone (DDS) was used as the curing agent. The curing kinetics of different epoxy/DDS systems were investigated using non-isothermal differential scanning calorimetry (DSC). The results showed that the values of activation energy (E) were affected by the chemical structure of epoxy resin, and BPEBF exhibited lower curing reactivity towards DDS compared to E-51.
2003 ◽
Vol 88
(13)
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pp. 2932-2941
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2017 ◽
Vol 30
(3)
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pp. 303-311
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2011 ◽
Vol 233-235
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pp. 1834-1837
2016 ◽
Vol 126
(2)
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pp. 771-784
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Keyword(s):
2007 ◽
Vol 104
(3)
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pp. 2054-2063
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2011 ◽
Vol 233-235
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pp. 2337-2340
2006 ◽
Vol 99
(6)
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pp. 3658-3668
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Keyword(s):
2011 ◽
Vol 84-85
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pp. 42-46