Research on Chemical Mechanical Polishing for Silicon Nitride Ceramics

2008 ◽  
Vol 375-376 ◽  
pp. 283-287
Author(s):  
Cong Rong Zhu ◽  
Ju Long Yuan ◽  
Qin Xu ◽  
Bing Hai Lv
Keyword(s):  
Silicon Nitride ◽  
Chemical Mechanical Polishing ◽  
Research Result ◽  
Surface Profile ◽  
Mechanical Polishing ◽  
Machining Process ◽  
Good Thermal Stability ◽  
Nitride Ceramics ◽  
Ultra Precision ◽  
Small Density

Silicon nitride ceramics materials have excellent properties such as small density, high rigidity, high Young's modulus, high wearability, good thermal stability and chemical stability, which make it become one of the most appropriate materials for rollers of high precision bearing. Chemical Mechanical Polishing (CMP) technology is employed to have an ultra-precision machining process for silicon nitride ceramics materials workpiece and the effects of workpiece surface roughness in different abrasive are discussed in this research. The XRD and SEM technology are used to take phase analysis and surface profile detection for the finishing workpiece polished with CeO2 abrasive. The chemical reaction mechanism and the material remove mechanism of silicon nitride ceramics materials in CMP process with CeO2 abrasive are both analysed and discussed in this paper. The research result shows that an extremely smooth surface of silicon nitride ceramics materials workpiece with roughness 5nm Ra is obtained after CMP process with polyurethane polishing pad and CeO2 abrasive.

Research on Ultra-Precision Machining of Silicon Nitride Ceramics: A Review

2012 ◽  
Vol 497 ◽  
pp. 294-298 ◽  
Author(s):  
Su Jiang Dai ◽  
Yu Gang Ren ◽  
Tao Kong ◽  
Yong Liang Hu
Keyword(s):  
Silicon Nitride ◽  
Precision Machining ◽  
Advantages And Disadvantages ◽  
Nitride Ceramics ◽  
Ultra Precision

The contemporary aspects of ultra precision machining of Si3N4 with regards to enhanced productivity and precision demands is presented in this paper. This paper reviews the literature on machining technology of covering the history, Several machining methods of Si3N4 are discussed. By comparing their advantages and disadvantages, some beneficial conclusions, which have some guiding significance for the coming practical works, are reached.

Next-Generation, Super-Hard-to-Process Substrates and Their High-Efficiency Machining Process Technologies Used to Create Innovative Devices

2018 ◽  
Vol 12 (2) ◽  
pp. 145-153 ◽  
Author(s):  
Toshiro Doi ◽  
Keyword(s):  
Chemical Mechanical Polishing ◽  
High Speed ◽  
High Efficiency ◽  
High Pressure Processing ◽  
Machining Process ◽  
Next Generation ◽  
Plasma Chemical ◽  
Plasma Fusion ◽  
Ultra Precision ◽  
Efficient Processing

SiC, GaN, and diamond are known as super-hard-to-process substrate for next-generation green devices. In this paper, we report on some breakthrough in developing highly efficient processing for such hard-to-process materials, for which we propose improvements in conventional processing, and innovative processing. As part of our project, we developed a “dilatancy pad®” that can efficiently produce high-quality surfaces as well as a high-rigidity, high-speed and high-pressure processing machine. We also designed and prototyped “plasma fusion CMP®,” which is an innovative processing technology fusing CMP (Chemical Mechanical Polishing) with P-CVM (Plasma Chemical Vaporization Machining) to machine super-hard diamond substrates that are considered indispensable for future devices. Before the advent of “singularities” by 2045, super-hard-to-process substrates and ultra-precision polishing technology will become more and more essential.

Research on Mechanism of Chemical Mechanical Polishing Process for Silicon Nitride Balls with CeO2 Abrasive

2008 ◽  
Vol 53-54 ◽  
pp. 131-136 ◽  
Author(s):  
Cong Rong Zhu ◽  
Bing Hai Lv ◽  
Ju Long Yuan
Keyword(s):  
Silicon Nitride ◽  
Chemical Mechanical Polishing ◽  
Mechanical Action ◽  
Mechanical Polishing ◽  
Test Results ◽  
Free Energy Of Formation ◽  
Key Factor ◽  
Ball Surface ◽  
Chemical Mechanical Polishing Process ◽  
Gibb’S Free Energy

Studies on chemical mechanical polishing (CMP) for silicon nitride (Si3N4) balls with CeO2 abrasive carried to investigate the mechanism of chemo-mechanical action between silicon nitride and CeO2. It is found that CeO2 is more effective to obtain smooth Si3N4 balls than other abrasives, and extremely smooth Si3N4 balls with surface Ra 4nm were obtained after polishing. XRD test is used to detect the reaction resultants on the ball surface, and the results show that SiO2 is the main resultant of the chemical reaction between Si3N4 and CeO2, and the test results confirm the correctness of thermodynamic analysis based on Gibb’s free energy of formation. It is also found that water play as a key factor in CMP.

Silicon Nitride Chemical Mechanical Polishing Mechanisms

1998 ◽  
Vol 145 (11) ◽  
pp. 3919-3925 ◽  
Author(s):  
Y. Z. Hu ◽  
R. J. Gutmann ◽  
T. P. Chow
Keyword(s):  
Silicon Nitride ◽  
Chemical Mechanical Polishing ◽  
Mechanical Polishing

Colloidal Silica based High Selectivity Shallow Trench Isolation (STI) Chemical Mechanical Polishing (CMP) Slurry

2005 ◽  
Vol 867 ◽  
Author(s):  
Kyoung-Ho Bu ◽  
Brij M. Moudgil
Keyword(s):  
Silicon Nitride ◽  
Chemical Mechanical Polishing ◽  
Colloidal Silica ◽  
Sodium Dodecyl ◽  
Mechanical Polishing ◽  
Wafer Surface ◽  
Shallow Trench Isolation ◽  
Pattern Size ◽  
Trench Isolation ◽  
Silica Slurry

AbstractAmong various properties of chemical mechanical polishing (CMP) slurry, selectivity plays a key role in global planarization of high density and small pattern size shallow trench isolation (STI) process. Lack of adequate selectivity can lead to defects such as dishing and erosion. To improve the selectivity of STI CMP process, CMP characteristics of silica and silicon nitride wafer were investigated using colloidal silica slurry as a function of slurry pH. Sodium dodecyl sulfate (SDS), an anionic surfactant, was added to increase the selectivity of the slurry. As a result, selectivity increased from 3 to 25. It was concluded that selective passivation layer formed on silicon nitride wafer surface at acidic slurry pH range was responsible for the observed selectivity increase. Adsorption characteristics of SDS on silica and silicon nitride were measured as a function of slurry pH and concentration of SDS. As indicated by zeta potential behavior under acidic pH conditions, SDS adsorption on silicon nitride was significantly higher han silica due to the electrostatic forces. Significantly higher SDS coating on silicone nitride seems to have resulted in lubrication layer leading to increased polishing selectivity.

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