Effects of the Substrate Temperature on the Structure and Properties of Cd1-xMnxTe Films

2014 ◽  
Vol 633 ◽  
pp. 269-272 ◽  
Author(s):  
Jun Nan Wang ◽  
Lin Wang ◽  
Huan Huan Ji ◽  
Bing Ren ◽  
Yi Ming Yang ◽  
...  

Cd1-xMnxTe (CdMnTe) can be a good candidate for gamma and X-ray detection because of its wide band-gap, high resistivity, and good electro-transport properties. Polycrystalline CdMnTe films were grown by closed-space sublimation method on glasses at different substrate temperatures. In this paper, substrate temperature dependent surface morphology, chemical composition, structural and electrical properties of CdMnTe films are investigated systematically.

2015 ◽  
Vol 1109 ◽  
pp. 104-107
Author(s):  
K.L. Foo ◽  
U. Hashim ◽  
Chun Hong Voon ◽  
M. Kashif

ZnO nanorods, type of the metal-oxide semiconductor deposited on interdigitated electrode (IDE) substrate using hydrothermal growth technique. The growth ZnO nanorods was annealed in furnace at 500°C for 2 hours as to obtain highly crystallite of ZnO nanorods. XRD pattern indicated the synthesized ZnO nanorods have preferred orientation along the (002) plane. Moreover, FESEM images showed that the nanorods with the size less than 60 nanometer were successfully synthesized using hydrothermal growth technique. The investigation on optical properties using UV-Vis-NIR spectrophotometer confirmed ZnO is classified as a wide band gap semiconductor material. Furthermore, the growth ZnO nanorods which undergo electrical properties testing using dielectric analyzer and source meter show that the ZnO nanorods demonstrated rectifying behaviour.


2013 ◽  
Vol 546 ◽  
pp. 375-378 ◽  
Author(s):  
Gwangseok Yang ◽  
Younghun Jung ◽  
Seungju Chun ◽  
Donghwan Kim ◽  
Jihyun Kim

2014 ◽  
Vol 11 (7-8) ◽  
pp. 1190-1193 ◽  
Author(s):  
Ayaka Usui ◽  
Aya Uruno ◽  
Masakazu Kobayashi

1995 ◽  
Vol 395 ◽  
Author(s):  
Charles R. Jones ◽  
Ting Lei ◽  
Ron Kaspi ◽  
Keith R. Evans

ABSTRACTThe kinetics of Ga incorporation during gas-source molecular beam epitaxy of GaN are investigated for varying substrate temperature and incident ammonia flux. Incident Ga atoms eventually either: 1) react with NH3 to form GaN, 2) accumulate on the film surface, or 3) desorb. Low substrate temperatures lead to significant Ga surface accumulation due to the temperature-dependent reactivity of NH3 towards Ga. High substrate temperatures give rise to significant Ga desorption. Increasing NH3 flux retards both Ga surface accumulation and Ga desorption. The GaN formation rate variation with substrate temperature peaks near 750°C and increases with NH3 flux. The observation of two distinct and very low activation energies for Ga desorption suggests a relatively complex surface chemistry and a strong likelihood that hydrogen is playing an important role.


2014 ◽  
Vol 1061-1062 ◽  
pp. 209-214 ◽  
Author(s):  
Zi Yue Yang ◽  
Li Dong Wang ◽  
Rui Xuan Song ◽  
Dong Xing Zhang ◽  
Wei Dong Fei

Cu (In,Ga)Se2(CIGS) thin films were prepared by direct magnetron sputtering CIGS quaternary target at the substrate temperature varying from room temperature (RT) to 300 °C. The effects of substrate temperature on the structural and electrical properties of CIGS films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX) and Hall effect measurement. The CIGS thin films with a chalcopyrite structure were obtained between 100 and 300 °C and the crystallinity of films were enhanced with the increase of the substrate temperature from 100 to 300 °C. The film compositions were consisted with the target when the substrate temperatures were between RT and 200 °C, however, it deviated from the stoichiometry of the target when the substrate temperature was 300 °C. The CIGS films deposited at 200 °C had the higher carrier mobility of 3.522 cm2/Vs.


Sign in / Sign up

Export Citation Format

Share Document