Quasi-Freestanding Graphene on SiC(0001)

2010 ◽  
Vol 645-648 ◽  
pp. 629-632 ◽  
Author(s):  
Florian Speck ◽  
Markus Ostler ◽  
Jonas Röhrl ◽  
Johannes Jobst ◽  
Daniel Waldmann ◽  
...  

We report on a comprehensive study of the properties of quasi-freestanding monolayer and bilayer graphene produced by conversion of the (6√3×6√3)R30° reconstruction into graphene via intercalation of hydrogen. The conversion is confirmed by photoelectron spectroscopy and Raman spectroscopy. By using infrared absorption spectroscopy we show that the underlying SiC(0001) surface is terminated by hydrogen in the form of Si-H bonds. Using Hall effect measurements we have determined the carrier concentration and type as well as the mobility which lies well above 1000 cm2/Vs despite a significant amount of short range scatterers detected by Raman spectroscopy.

2018 ◽  
Vol 31 (3) ◽  
pp. 20
Author(s):  
Sarmad M. M. Ali ◽  
Alia A.A. Shehab ◽  
Samir A. Maki

In this study, the ZnTe thin films were deposited on a glass substrate at a thickness of 400nm using vacuum evaporation technique (2×10-5mbar) at RT. Electrical conductivity and Hall effect measurements have been investigated as a function of variation of the doping ratios (3,5,7%) of the Cu element on the thin ZnTe films. The temperature range of (25-200°C) is to record the electrical conductivity values. The results of the films have two types of transport mechanisms of free carriers with two values of activation energy (Ea1, Ea2), expect 3% Cu. The activation energy (Ea1) increased from 29meV to 157meV before and after doping (Cu at 5%) respectively. The results of Hall effect measurements of ZnTe , ZnTe:Cu films show that all films were (p-type), the carrier concentration (1.1×1020 m-3) , Hall mobility (0.464m2/V.s) for pure ZnTe film, increases the carrier concentration (6.3×1021m-3) Hall mobility (2m2/V.s) for doping (Cu at 3%) film, but  decreases by increasing Cu concentration.


1999 ◽  
Author(s):  
Simon Tam ◽  
Michelle E. DeRose ◽  
Mario E. Fajardo ◽  
Norihito Sogoshi ◽  
Yoshiyasu Kato

2021 ◽  
Author(s):  
Adam J. Fleisher ◽  
Hongming Yi ◽  
Abneesh Srivastava ◽  
Oleg L. Polyansky ◽  
Nikolai F. Zobov ◽  
...  

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