Research on a Magnetic-Electrochemical Compound Polishing Head

2014 ◽  
Vol 800-801 ◽  
pp. 858-863
Author(s):  
Li Min Shi
Keyword(s):  
Magnetic Field ◽  
Electrochemical Reaction ◽  
Electrical Field ◽  
Key Factor ◽  
Polishing Tool

In the paper, a new polishing head is researched and developed. How to set a magnetic feild is a key factor in magnetic-electrochemical compound polishing. To add a magnetic field that is parallel to electrical field, the electrochemical reaction can be changed greatly. Additionally, to add a magnetic field whose direction is changed to and fro, the efficiency of the polishing can be improved especially. In order to adapt to this theory, a new polishing head in magnec-electrochemical compound polishing is required resarch and development. Furthermore,the tool can be fixed on spindle of CNC easily and the tool is flexible so it can make the polishing head and workpiece touch evenly each other. Especially being noticed, the head of magnetic-electrochemical compound polishing tool is a series in order that the head can be replaced conveniently according to different surface. At last, the tool is tested and its function is perfect.

The Function of Magnetic Field in a Magnetic-Electrochemical Compound Polishing

2010 ◽  
Vol 97-101 ◽  
pp. 4141-4145 ◽  
Author(s):  
Li Min Shi ◽  
Er Liang Liu ◽  
Yong Jiang Niu ◽  
Yu Quan Chen
Keyword(s):  
Magnetic Field ◽  
Mathematical Model ◽  
Concentration Polarization ◽  
Electrochemical Reaction ◽  
Charged Particles ◽  
Polishing Process ◽  
Electrical Field ◽  
Movement Model ◽  
The Mathematical Model ◽  
The Magnetic Field

Traditionally, the magnetic field is always vertical to the electrical field in a magnetic-electrochemical compound polishing.The magnetic field is set to parallel the electrical field in this paper. The mathematical model of the charged particles movement in a magnetic field is established through the analysis of its movement process when using Coulomb laws and Lorentz force. Through constructing the velocity formulation and loci formulation, the function of the magnetic field is proved. Because of the magnetic field, the concentration polarization of electrochemical reaction can be reduced more and the electrochemical reaction can be accelerated easily than the traditional polishing in which the magnetic field is vertical to the electrical field. Finally, to verify the model, the magnetic-electrochemical compound polishing process has been tested and the results, compared with those obtained from the model, have shown the movement model is reasonable and the analysis to function of magnetic field is correct.

Effect of magnetic field on the formation of macroporous silicon: structural and optical properties

2013 ◽  
Vol 1617 ◽  
pp. 63-68
Author(s):  
E. E. Antunez ◽  
J. O. Estevez ◽  
J. Campos ◽  
M. A. Basurto ◽  
V. Agarwal*
Keyword(s):  
Magnetic Field ◽  
Hall Effect ◽  
Light Emission ◽  
Electrochemical Reaction ◽  
Electrochemical Etching ◽  
High Resistivity ◽  
Macroporous Silicon ◽  
Structural And Optical Properties ◽  
Electrical Field ◽  
Silicon Interface

ABSTRACTThe conventional method to fabricate porous silicon with n-type substrates requires light assisted generation of holes used in the electrochemical reaction. Recently, two different methods have been proposed to fabricate some similar structures: Hall effect [1] and lateral electrical field [2]. Hall effect assisted etching involves the application of a perpendicular electric and magnetic field to achieve the concentration of holes at the HF/silicon interface to assist the electrochemical reaction, while the other involves the application of a lateral electrical field across the silicon wafer. In this work, the electrochemical etching of high resistivity n-type silicon wafers under the combined effect of magnetic and lateral electrical field to produce photoluminescent macroporous structures under dark conditions, is reported. A lateral gradient in pore sizes as well as in light emission is observed. Optical and structural properties were studied for their possible applications as a biosensor.

Electrical Anisotropy of Thin Metal Films Growing on Dielectric Substrates

2002 ◽  
Vol 7 (2) ◽  
pp. 45-52
Author(s):  
L. Jakučionis ◽  
V. Kleiza
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Uniaxial Anisotropy ◽  
Metal Films ◽  
Thin Layers ◽  
Electrical Anisotropy ◽  
Electrical Field ◽  
Dielectric Substrates ◽  
Unequal Probability ◽  
Conductive Thin Films

Electrical properties of conductive thin films, that are produced by vacuum evaporation on the dielectric substrates, and which properties depend on their thickness, usually are anisotropic i.e. they have uniaxial anisotropy. If the condensate grow on dielectric substrates on which plane electrical field E is created the transverse voltage U⊥ appears on the boundary of the film in the direction perpendicular to E. Transverse voltage U⊥ depends on the angle γ between the applied magnetic field H and axis of light magnetisation. When electric field E is applied to continuous or grid layers, U⊥ and resistance R of layers are changed by changing γ. It means that value of U⊥ is the measure of anisotropy magnitude. Increasing voltage U0 , which is created by E, U⊥ increases to certain magnitude and later decreases. The anisotropy of continuous thin layers is excited by inequality of conductivity tensor components σ0 ≠ σ⊥. The reason of anisotropy is explained by the model which shows that properties of grain boundaries are defined by unequal probability of transient of charge carrier.

scholarly journals Unsteady electromagnetic radiative nanofluid stagnation-point flow from a stretching sheet with chemically reactive nanoparticles, Stefan blowing effect and entropy generation

2018 ◽  
Vol 232 (2-3) ◽  
pp. 69-82 ◽  
Author(s):  
Puneet Rana ◽  
Nisha Shukla ◽  
O Anwar Bég ◽  
A Kadir ◽  
Bani Singh
Keyword(s):  
Magnetic Field ◽  
Stagnation Point ◽  
Entropy Generation ◽  
Stretching Sheet ◽  
Nonlinear Partial Differential Equations ◽  
Stagnation Point Flow ◽  
Dimensional System ◽  
Electrical Field ◽  
Electric Parameter ◽  
Entropy Generation Number

This article investigates the combined influence of nonlinear radiation, Stefan blowing and chemical reactions on unsteady electro-magneto-hydrodynamic stagnation-point flow of a nanofluid from a horizontal stretching sheet. Both electrical and magnetic body forces are considered. In addition, the effects of velocity slip, thermal slip and mass slip are considered at the boundaries. An analytical method named as homotopy analysis method is applied to solve the non-dimensional system of nonlinear partial differential equations which are obtained by applying similarity transformations on governing equations. The effects of emerging parameters such as Stefan blowing parameter, electric parameter and magnetic parameter on the important physical quantities are presented graphically. In addition, an entropy generation analysis is provided in this article for thermal optimization. The flow is observed to be accelerated both with increasing magnetic field and electrical field. Entropy generation number is markedly enhanced with greater magnetic field, electrical field and Reynolds number, whereas it is reduced with increasing chemical reaction parameter.

Comparison of the Effects of Bias Voltage and Transverse Magnetic Field on the Macro-Particles Distribution on the Surface of TiN Films Prepared by Arc Ion Plating

2011 ◽  
Vol 337 ◽  
pp. 300-306
Author(s):  
Wen Chang Lang
Keyword(s):  
Magnetic Field ◽  
Transverse Magnetic Field ◽  
Field Intensity ◽  
Magnetic Field Intensity ◽  
Transverse Magnetic ◽  
Key Factor ◽  
Influence Parameter ◽  
Two Parameters ◽  
Influence Degree ◽  
The Magnetic Field

The object of this article is to make research on the influence of transverse magnetic field and pulse bias on macro-particles on the surface of film, find the systematic law and analyze the influence law and reasons of the two parameters (transverse magnetic field and pulse bias), according to the mechanism of arc spot movement and the interaction between macro-particles and plasma. Moreover, this article aims at seeking the most important influence parameter and comparing the effect of the two parameters. Research in this paper indicates that: the key factor is the magnetic field controlled arc spot movement, because the influence of magnetic field on reducing macro-particles is much larger than bias, and the influence degree of bias on macro-particles varies with the magnetic field intensity; action of bias is obvious under the condition of low magnetic field intensity, but as the magnetic field intensity increases, its action becomes weaker and weaker; besides, purification effect of bias on particles in larger size is better than on particles in smaller size.

Development of a New Magnetic-Electrochemical Compound Polishing Tool

2011 ◽  
Vol 487 ◽  
pp. 298-302
Author(s):  
Li Min Shi ◽  
Jiang Niu Yong ◽  
J. Liu ◽  
Er Liang Liu
Keyword(s):  
Magnetic Field ◽  
Chemical Reaction ◽  
Charged Particles ◽  
Polishing Tool ◽  
The Magnetic Field

Added a magnetic field whose direction is parallel to the electrical field’s directions, the charged particles between two electrodes can move in spirals in magnetic-electrochemical compound polishing, and then the condition of chemical reaction is improved. The efficiency and quality of polishing can be promoted consequently. If the direction of magnetic field is changed alternative, the effect of polishing can be improved more clearly. In the paper, a new magnetic-electrochemical compound polishing tool is developed. The tool can be fixed on spindle of CNC easily. The tool is flexible, so it can make the polishing head and workpiece touch evenly each other. Because the head of magnetic-electrochemical compound polishing tool is a series, the head can be replaced conveniently according to different surface. Particularly, the tool can set a magnetic field whose direction is parallel to the electrical field’s direction. The tool can change strength of the magnetic field easily. At last, the tool is tested and its function is perfect.

Sign in / Sign up

Export Citation Format

Share Document