Preparation of Ni-C Thin Films for Strain Sensor Applications in New Hybrid Laminates with Thermoplastic Matrix

2015 ◽  
Vol 825-826 ◽  
pp. 548-555 ◽  
Author(s):  
Daniel Wett ◽  
Daisy Nestler ◽  
Guntram Wagner ◽  
Bernhard Wielage ◽  
Thomas Seider ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Hot Pressing ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Dc Magnetron Sputtering ◽  
Sensors And Actuators ◽  
Smart Systems ◽  
Sensor Applications ◽  
Hybrid Laminates

Hybrid laminates with thermoplastic matrices offer clear advantages over laminates based on thermosetting resins. These include the formability, recyclability as well as the suitability for mass production, to name a few. The inline integration of smart systems like sensors and actuators in the hybrid laminates during the hot-pressing process is one of the long-term objectives of the Federal Cluster of Excellence MERGE. This work aims to deposit Ni-C thin films by dc magnetron sputtering on polyimide substrates for the application as strain sensors in hybrid laminates. During the first step hybrid laminates containing different polyimide foils were prepared by hot-pressing, this was followed by the mechanical testing and selection of the most suitable polyimide substrate for the Ni-C thin film deposition. The second part consisted of depositing Ni-C thin films by means of dc magnetron sputtering and utilising different Ni-C plug targets. The films were characterised regarding their growth rate, composition, structure and temperature coefficient of electrical resistance.

scholarly journals Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 859 ◽  
Author(s):  
Wei-Kai Wang ◽  
Kuo-Feng Liu ◽  
Pi-Chuen Tsai ◽  
Yi-Jie Xu ◽  
Shih-Yung Huang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Thermal Annealing ◽  
Annealing Temperature ◽  
Annealing Treatment ◽  
Average Crystallite Size ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Atmospheric Conditions

Zinc gallate (ZnGa2O4) thin films were grown on sapphire (0001) substrate using radio frequency (RF) magnetron sputtering. After the thin film deposition process, the grown ZnGa2O4 was annealed at a temperature ranging from 500 to 900 °C at atmospheric conditions. The average crystallite size of the grown ZnGa2O4 thin films increased from 11.94 to 27.05 nm as the annealing temperature rose from 500 to 900 °C. Excess Ga released from ZnGa2O4 during thermal annealing treatment resulted in the appearance of a Ga2O3 phase. High-resolution transmission electron microscope image analysis revealed that the preferential crystallographic orientation of the well-arranged, quasi-single-crystalline ZnGa2O4 (111) plane lattice fringes were formed after the thermal annealing process. The effect of crystallite sizes and lattice strain on the width of the X-ray diffraction peak of the annealed ZnGa2O4 thin films were investigated using Williamson-Hall analysis. The results indicate that the crystalline quality of the deposited ZnGa2O4 thin film improved at higher annealing temperatures.

Electrical and Thermal Properties of Platinum Thin Films Prepared by DC Magnetron Sputtering for Micro-Heater of Microsensor Applications after CMP Process

2007 ◽  
Vol 124-126 ◽  
pp. 267-270 ◽  
Author(s):  
Nam Hoon Kim ◽  
Dong Myong Na ◽  
Pil Ju Ko ◽  
Jin Seong Park ◽  
Woo Sun Lee
Keyword(s):  
Thin Films ◽  
Thermal Properties ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Power Consumption ◽  
Chemical Mechanical Polishing ◽  
Thermal Characteristics ◽  
Remarkable Difference ◽  
Dc Magnetron Sputtering ◽  
Sensor Applications

Chemical mechanical polishing (CMP) of platinum thin films was performed for the improvement of surface morphology. Platinum thin films after CMP process with alumina slurry showed the increase of surface morphology without a remarkable difference of the thermal characteristics of as-annealed platinum thin films. The power consumption of platinum thin films micro-heater also became very low by improvement of surface morphology after CMP process. The similar or improved electrical and thermal characteristics of platinum thin films for micro-heater of sensor applications as well as evaluation possibility of sensing property by the improved surface morphology were obtained after CMP process.

Properties investigation of thin films photovoltaic hetero-structures

2014 ◽  
Vol 11 (3) ◽  
pp. 233-238 ◽  
Author(s):  
G. Golan ◽  
A. Axelevitch ◽  
Jacob Azoulay
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Thin Film Deposition ◽  
Open Circuit ◽  
Film Deposition ◽  
Photovoltaic Properties ◽  
Silicon Thin Films

This paper presents an experimental investigation of photovoltaic (PV) properties in heterostructures consisting of indium oxide and amorphous silicon thin films, grown on a single crystalline p-type silicon and polyimide flexible substrates. Both thin films: In2O3 and a-Si were deposited by magnetron sputtering. Such heterostructure thin film systems are attractive because of their ability to convert solar energy into electrical one. Grown Heterostructures films were treated by simultaneous influence of an electron beam and high energetic photons with energy more than 1.5 eV in the so called vacuum photo-thermal processing (VPP).Silicon samples of 100 Ω/sq and 45 Ω/sq were selected as substrates. Thin films deposition was done in argon atmosphere by DC magnetron sputtering.It is shown that:Open circuit voltage of the proposed structure may reach up to ~ 0.35 V,Short circuit current was of no more then 10-7 A,Polyimide materials may be used as substrates for PV thin film deposition structures,VPP dramatically varies the photovoltaic properties of the heterostructure

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6311-6316 ◽  
Author(s):  
Pongladda Panyajirawut ◽  
Nattha Pratumsuwan ◽  
Kornkamon Meesombad ◽  
Kridsana Thanawattana ◽  
Artit Chingsungnoen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering

Vacuum ◽  
2020 ◽  
Vol 177 ◽  
pp. 109355
Author(s):  
Nils Nedfors ◽  
Daniel Primetzhofer ◽  
Igor Zhirkov ◽  
Justinas Palisaitis ◽  
Per O.Å. Persson ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Phenethylammonium bismuth halides: from single crystals to bulky-organic cation promoted thin-film deposition for potential optoelectronic applications

2019 ◽  
Vol 7 (36) ◽  
pp. 20733-20741 ◽  
Author(s):  
Mehri Ghasemi ◽  
Miaoqiang Lyu ◽  
Md Roknuzzaman ◽  
Jung-Ho Yun ◽  
Mengmeng Hao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Single Crystals ◽  
Organic Cation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optoelectronic Applications ◽  
Excellent Stability

The phenethylammonium cation significantly promotes the formation of fully-covered thin-films of hybrid bismuth organohalides with low surface roughness and excellent stability.

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