Electrical and Thermal Properties of Platinum Thin Films Prepared by DC Magnetron Sputtering for Micro-Heater of Microsensor Applications after CMP Process

Chemical mechanical polishing (CMP) of platinum thin films was performed for the improvement of surface morphology. Platinum thin films after CMP process with alumina slurry showed the increase of surface morphology without a remarkable difference of the thermal characteristics of as-annealed platinum thin films. The power consumption of platinum thin films micro-heater also became very low by improvement of surface morphology after CMP process. The similar or improved electrical and thermal characteristics of platinum thin films for micro-heater of sensor applications as well as evaluation possibility of sensing property by the improved surface morphology were obtained after CMP process.

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THE INFLUENCE OF SPUTTERING BIAS-VOLTAGE ON LaB6 FILM'S CHARACTERISTICS

Modern Physics Letters B ◽

10.1142/s0217984909019077 ◽

2009 ◽

Vol 23 (08) ◽

pp. 1077-1083 ◽

Cited By ~ 3

Author(s):

JING XU ◽

GUANGHUI MIN ◽

XIAOHUA ZHAO ◽

LIJIE HU ◽

HUASHUN YU

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Magnetron Sputtering ◽

Bias Voltage ◽

Diffraction Peak ◽

Dc Magnetron Sputtering ◽

Crystal Face ◽

Deposited Films ◽

Stylus Profiler ◽

Lanthanum Boride

The deposition of lanthanum boride ( LaB 6) thin films by the DC magnetron sputtering were studied. XRD, AFM and Stylus Profiler were used to characterize the properties of the deposited films. The XRD was used to study the crystallinity. The results of the XRD showed that the dominant crystal face is the (100) face. The crystallinity decreased with the increased bias-voltage value, but the influence of bias-voltage on the films is different on different crystal faces. The intensity (100) face was influenced by the bias-voltage more obviously than other faces except the influence of thickness. The diffraction peak maximal intensity of the (100) face changed from 1256 (on 0 V) to 580 (on -150 V), but the intensity of (110) face changed from 614 (on 0 V) to 486 (on -150 V). The rel. int (100%) of the (110) face changed from 38.70 to 74.52. The deposition rate decreased with the increased bias-voltage value, but the decrease was not obvious. The maximum and minimum of the deposition ratio were 17.53 nm and 13.75 nm respectively. Surface morphology of the films was studied by the AFM. The crystallite of the films was less than 50 nm. The maximal roughness of the films decreased first and increased afterward, and the maximum was obtained on the -50 V bias-voltage.

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Preparation of Ni-C Thin Films for Strain Sensor Applications in New Hybrid Laminates with Thermoplastic Matrix

Materials Science Forum ◽

10.4028/www.scientific.net/msf.825-826.548 ◽

2015 ◽

Vol 825-826 ◽

pp. 548-555 ◽

Cited By ~ 2

Author(s):

Daniel Wett ◽

Daisy Nestler ◽

Guntram Wagner ◽

Bernhard Wielage ◽

Thomas Seider ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Hot Pressing ◽

Thin Film Deposition ◽

Film Deposition ◽

Dc Magnetron Sputtering ◽

Sensors And Actuators ◽

Smart Systems ◽

Sensor Applications ◽

Hybrid Laminates

Hybrid laminates with thermoplastic matrices offer clear advantages over laminates based on thermosetting resins. These include the formability, recyclability as well as the suitability for mass production, to name a few. The inline integration of smart systems like sensors and actuators in the hybrid laminates during the hot-pressing process is one of the long-term objectives of the Federal Cluster of Excellence MERGE. This work aims to deposit Ni-C thin films by dc magnetron sputtering on polyimide substrates for the application as strain sensors in hybrid laminates. During the first step hybrid laminates containing different polyimide foils were prepared by hot-pressing, this was followed by the mechanical testing and selection of the most suitable polyimide substrate for the Ni-C thin film deposition. The second part consisted of depositing Ni-C thin films by means of dc magnetron sputtering and utilising different Ni-C plug targets. The films were characterised regarding their growth rate, composition, structure and temperature coefficient of electrical resistance.

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Effect of film thickness on surface morphology and optical properties of nanostructured Zinc Aluminum Oxide thin films deposited by DC magnetron sputtering

10.1063/1.4732414 ◽

2012 ◽

Author(s):

B. Rajesh Kumar ◽

T. Subba Rao

Keyword(s):

Thin Films ◽

Optical Properties ◽

Surface Morphology ◽

Magnetron Sputtering ◽

Aluminum Oxide ◽

Film Thickness ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Zinc Aluminum Oxide

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Surface morphology and dynamic scaling in growth of iron nitride thin films deposited by dc magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1582452 ◽

2003 ◽

Vol 21 (4) ◽

pp. 983-987 ◽

Cited By ~ 8

Author(s):

X. Wang ◽

W. T. Zheng ◽

L. J. Gao ◽

L. Wei ◽

W. Guo ◽

...

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Magnetron Sputtering ◽

Iron Nitride ◽

Dynamic Scaling ◽

Dc Magnetron Sputtering

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INVESTIGATION OF THE PROPERTIES OF SILVER THIN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING

Surface Review and Letters ◽

10.1142/s0218625x17500536 ◽

2016 ◽

Vol 24 (04) ◽

pp. 1750053 ◽

Cited By ~ 2

Author(s):

LINWEN WANG ◽

LING LI ◽

WEI-DONG CHEN

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Magnetron Sputtering ◽

Sheet Resistance ◽

Optical Transmittance ◽

Localized Surface Plasmon ◽

Dc Magnetron Sputtering ◽

Force Microscopy ◽

Atomic Force ◽

Sputtering Power

In this paper, we studied the surface morphology of silver (Ag) thin films deposited on glass substrate by using the DC magnetron sputtering with various power conditions at room temperature. The surface morphology, the optical and electrical properties were measured by AFM (Atomic Force Microscopy), UV–Vis Spectrophotometer (Lambda 950), and the four-probe method (RTS-9, Four Probes Technology). The effect of the sputtering power on the root-mean-square (RMS) surface roughness of Ag thin films was analyzed. The experiment results showed that the RMS value was lowest in the range from 60[Formula: see text]W to 80[Formula: see text]W. At the same time, the effect of the thickness on optical transmittance and sheet resistance was also investigated. We found the rough surface was prejudiced to inducing sheet resistance and enhancing the optical transmittance when the thickness of Ag thin films was thin. In addition, the excitation of the localized surface plasmon resonance (LSPR) was due to Ag nanoparticles (NPs) based on the analysis of the FDTD (finite-difference time-domain) simulation.

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