Development of Ferromagnetic Sputtering Targets with High Performance
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The preparation methods of high performance ferromagnetic sputtering targets (including cobalt, nickel-platinum and nickel-iron alloy) for advanced semiconductor manufacturing were introduced. The properties of sputtering target, such as pass-through-flux (PTF), and grain size which affect the sputtering performance were well controlled by proper fabrication technique. The key factors that affect sputtering performance were also discussed.
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