Low-Temperature Crystallization of Poly-SiGe Thin-Films by Solid Phase Crystallization

2003 ◽  
Vol 93 ◽  
pp. 231-236 ◽  
Author(s):  
Kouichi Nakahata ◽  
M. Isomura ◽  
K. Wakisaka
1993 ◽  
Vol 1 (2) ◽  
pp. 203 ◽  
Author(s):  
Thomas W. Little ◽  
Hideki Koike ◽  
Ken-ichi Takahara ◽  
Takashi Nakazawa ◽  
Hiroyuki Ohshima

2020 ◽  
Vol 8 (11) ◽  
pp. 3669-3677
Author(s):  
Sheng-Han Yi ◽  
Kuei-Wen Huang ◽  
Hsin-Chih Lin ◽  
Miin-Jang Chen

Crystallization and ferroelectricity with high endurance are achieved in ZrO2 thin films at low temperature using an atomic layer plasma treatment technique.


2010 ◽  
Vol 10 (2) ◽  
pp. 761-764 ◽  
Author(s):  
Sharath Sriram ◽  
Madhu Bhaskaran ◽  
David R. G. Mitchell ◽  
Arnan Mitchell

1999 ◽  
Vol 26 (1-4) ◽  
pp. 187-195 ◽  
Author(s):  
Yoshihiro Sawada ◽  
Hideya Kobari ◽  
Yoshimi Sato ◽  
Akira Hashimoto ◽  
Ichiro Koiwa ◽  
...  

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