High accuracy analysis for acceleration motion of vertically falling spherical particles in incompressible newtonian fluid by varinational iterations method

Author(s):  
Harpreet Kaur ◽  
B.P. Garg
1993 ◽  
Vol 37 ◽  
pp. 229-234 ◽  
Author(s):  
H. Kohno ◽  
T. Arai ◽  
Y. Araki ◽  
R. Wilson

The wafer analyzer has been used to fulfil many applications needs in the semiconductor industry. The prominent features of the XRF method for the semiconductor industry are:analysis of many types of films, e.g., oxides, silicides and metallic alloys, and simultaneous analysis of film thickness and compositions.In the past, the analysis results of BPSG (Boron-doped Phospho-Silicate Glass) films, with thicknesses greater than 4000 Å, were reported. With the recent increased demand for larger scale and higher quality semiconductor devices (larger than 64 Mbit), more accurate analysis with high precision has been required.


2000 ◽  
Vol 126 (2) ◽  
pp. 149-156 ◽  
Author(s):  
Toshiaki Iwase ◽  
Ken-ichi Hirashima

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