Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin film

Acta Physica Sinica ◽

10.7498/aps.59.2653 ◽

2010 ◽

Vol 59 (4) ◽

pp. 2653

Author(s):

Liu Li-Ying ◽

Zhang Jia-Liang ◽

Guo Qing-Chao ◽

Wang De-Zhen

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Polycrystalline Silicon ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Jets ◽

Silicon Thin Film ◽

Pressure Plasma

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Characteristics of SiO[sub x] Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition Using PDMS∕O[sub 2]∕He

Journal of The Electrochemical Society ◽

10.1149/1.3129464 ◽

2009 ◽

Vol 156 (7) ◽

pp. D248 ◽

Author(s):

J. H. Lee ◽

Y. S. Kim ◽

J. S. Oh ◽

S. J. Kyung ◽

J. T. Lim ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Pressure Plasma

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The growth characteristics of microcrystalline Si thin film deposited by atmospheric pressure plasma-enhanced chemical vapor deposition

Electronic Materials Letters ◽

10.1007/s13391-013-6033-3 ◽

2013 ◽

Vol 9 (6) ◽

pp. 875-878 ◽

Author(s):

Jung-Dae Kwon

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Growth Characteristics ◽

Pressure Plasma ◽

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Electrical Characteristics of Magnesium Doped a-IGZO RRAM: Chemical Vapor Deposition using Enhanced Atmospheric Pressure-Plasma

2020 IEEE Eurasia Conference on IOT, Communication and Engineering (ECICE) ◽

10.1109/ecice50847.2020.9301987 ◽

2020 ◽

Author(s):

Chien-Hung Wu ◽

Song-Nian Kuo ◽

Yi-Ming Chen ◽

Kow-Ming Chang ◽

Yu Yang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Electrical Characteristics ◽

Pressure Plasma

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Atmospheric‐pressure plasma‐enhanced chemical vapor deposition of nanocomposite thin films from ethyl lactate and silica nanoparticles

Plasma Processes and Polymers ◽

10.1002/ppap.202000153 ◽

2020 ◽

Author(s):

Natalia Milaniak ◽

Gaétan Laroche ◽

Françoise Massines

Keyword(s):

Chemical Vapor Deposition ◽

Silica Nanoparticles ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Ethyl Lactate ◽

Pressure Plasma ◽

Nanocomposite Thin Films

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Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of Borophosphosilicate Glass Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.1735 ◽

2008 ◽

Vol 47 (3) ◽

pp. 1735-1739 ◽

Author(s):

Minghui Yin ◽

Lingli Zhao ◽

Xiangyu Xu ◽

Shouguo Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Pressure Plasma ◽

Borophosphosilicate Glass ◽

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Surface modification of PDMS by atmospheric-pressure plasma-enhanced chemical vapor deposition and analysis of long-lasting surface hydrophilicity

Sensors and Actuators B Chemical ◽

10.1016/j.snb.2011.12.017 ◽

2012 ◽

Vol 162 (1) ◽

pp. 425-434 ◽

Author(s):

Donghee Lee ◽

Sung Yang

Keyword(s):

Surface Modification ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Surface Hydrophilicity ◽

Pressure Plasma

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Synthesis of SiOC(–H) Films by the Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Method

e-Journal of Surface Science and Nanotechnology ◽

10.1380/ejssnt.2015.445 ◽

2015 ◽

Vol 13 (0) ◽

pp. 445-450 ◽

Author(s):

Takanori Mori ◽

Taiki Masuko ◽

Akira Shirakura ◽

Tetsuya Suzuki

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Pressure Plasma

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Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3592 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3592-3597 ◽

Author(s):

Kiyoshi Yasutake ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Takuya Wakamiya ◽

Heiji Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Pressure Plasma ◽

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Polycrystalline silicon thin film transistors deposited at low substrate temperature by remote plasma chemical vapor deposition using SiF4/H2

Applied Physics Letters ◽

10.1063/1.112937 ◽

1994 ◽

Vol 65 (13) ◽

pp. 1644-1646 ◽

Author(s):

Jae Ik Woo ◽

Hong Joo Lim ◽

Jin Jang

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Substrate Temperature ◽

Vapor Deposition ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition

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Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon Oxide Layers for Low-Temperature Thin Film Transistors

10.7567/ssdm.2019.ps-10-11 ◽

2019 ◽

Author(s):

H. Kakiuchi ◽

H. Ohmi ◽

K. Yasutake

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Thin Film Transistors ◽

Silicon Oxide ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

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