Bilayered Etch-Stop Layer of Al2O3/SiO2for High-Mobility In–Ga–Zn–O Thin-Film Transistors
2013 ◽
Vol 52
(10R)
◽
pp. 100209
◽
Keyword(s):
2016 ◽
Vol 63
(7)
◽
pp. 2785-2789
◽
Keyword(s):
Keyword(s):
2014 ◽
Vol 22
(1)
◽
pp. 23-28
◽
2012 ◽
Vol 33
(6)
◽
pp. 899-901
◽
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):