Bilayered Etch-Stop Layer of Al2O3/SiO2for High-Mobility In–Ga–Zn–O Thin-Film Transistors

2013 ◽  
Vol 52 (10R) ◽  
pp. 100209 ◽  
Author(s):  
Sang-Hee Ko Park ◽  
Jong Woo Kim ◽  
Min-Ki Ryu ◽  
Jae-Eun Pi ◽  
Chi-Sun Hwang ◽  
...  
2016 ◽  
Vol 63 (7) ◽  
pp. 2785-2789 ◽  
Author(s):  
Daichi Koretomo ◽  
Tatsuya Toda ◽  
Tokiyoshi Matsuda ◽  
Mutsumi Kimura ◽  
Mamoru Furuta

2014 ◽  
Vol 22 (1) ◽  
pp. 23-28 ◽  
Author(s):  
Manoj Nag ◽  
Soeren Steudel ◽  
Ajay Bhoolokam ◽  
Adrian Chasin ◽  
Maarten Rockele ◽  
...  

2021 ◽  
Vol 52 (S1) ◽  
pp. 7-7
Author(s):  
Weihua Wu ◽  
Yi Zhuo ◽  
Fangmei Liu ◽  
Yuanpeng Chen ◽  
Jiangbo Yao ◽  
...  

2011 ◽  
Vol 1315 ◽  
Author(s):  
D. K. Ngwashi ◽  
R. B. M. Cross ◽  
S. Paul ◽  
Andrian P. Milanov ◽  
Anjana Devi

ABSTRACTIn order to investigate the performance of ZnO-based thin film transistors (ZnO-TFTs), we fabricate devices using amorphous hafnium dioxide (HfO2) high-k dielectrics. Sputtered ZnO was used as the active channel layer, and aluminium source/drain electrodes were deposited by thermal evaporation, and the HfO2 high-k dielectrics are deposited by metal-organic chemical vapour deposition (MOCVD). The ZnO-TFTs with high-k HfO2 gate insulators exhibit good performance metrics and effective channel mobility which is appreciably higher in comparison to SiO2-based ZnO TFTs fabricated under similar conditions. The average channel mobility, turn-on voltage, on-off current ratio and subthreshold swing of the high-k TFTs are 31.2 cm2V-1s-1, -4.7 V, ~103, and 2.4 V/dec respectively. We compared the characteristics of a typical device consisting of HfO2 to those of a device consisting of thermally grown SiO2 to examine their potential for use as high-k dielectrics in future TFT devices.


2012 ◽  
Vol 33 (6) ◽  
pp. 899-901 ◽  
Author(s):  
Tae-Jun Ha ◽  
Prashant Sonar ◽  
Ananth Dodabalapur

2006 ◽  
Vol 89 (11) ◽  
pp. 112108 ◽  
Author(s):  
Shuhei Tatemichi ◽  
Musubu Ichikawa ◽  
Toshiki Koyama ◽  
Yoshio Taniguchi

2013 ◽  
Vol 184 ◽  
pp. 1-4 ◽  
Author(s):  
Hao Chang ◽  
Pengyue Wang ◽  
Haidong Li ◽  
Jidong Zhang ◽  
Donghang Yan

2021 ◽  
Vol 42 (10) ◽  
pp. 1480-1483
Author(s):  
Yining Yu ◽  
Nannan Lv ◽  
Dongli Zhang ◽  
Yiran Wei ◽  
Mingxiang Wang

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