Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography
2011 ◽
Vol 50
◽
pp. 036504
◽
2011 ◽
Vol 50
(3R)
◽
pp. 036504
◽
2012 ◽
Vol 51
(8R)
◽
pp. 086504
◽
2012 ◽
Vol 51
◽
pp. 086504
◽
2014 ◽
Vol 53
(8)
◽
pp. 084002
◽
2017 ◽
Vol 17
(11)
◽
pp. 8338-8343
2015 ◽
Vol 28
(5)
◽
pp. 669-675
◽
2017 ◽
Vol 30
(2)
◽
pp. 197-203
◽
2014 ◽
Vol 54
(1)
◽
pp. 016502
◽
2012 ◽
Vol 25
(5)
◽
pp. 625-631
◽