Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2mixing ratio

Jongchan Lee; Alexander Efremov; Kwangsoo Kim; Kwang-Ho Kwon

doi:10.7567/jjap.55.106201

Etching characteristics of SiC, SiO2, and Si in CF4/CH2F2/N2/Ar inductively coupled plasma: Effect of CF4/CH2F2mixing ratio

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.106201 ◽

2016 ◽

Vol 55 (10) ◽

pp. 106201 ◽

Cited By ~ 1

Author(s):

Jongchan Lee ◽

Alexander Efremov ◽

Kwangsoo Kim ◽

Kwang-Ho Kwon

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Plasma Effect

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Deposition of SiOx coatings by inductively coupled plasma: Effect of pulsed hexamethyldisiloxan flow

Plasma Processes and Polymers ◽

10.1002/ppap.201700186 ◽

2018 ◽

Vol 15 (4) ◽

pp. 1700186 ◽

Cited By ~ 3

Author(s):

Markus Brochhagen ◽

Sascha Chur ◽

Vincent Layes ◽

Marc Böke ◽

Jan Benedikt

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Plasma Effect

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Simple Model for Ion-Assisted Etching Using<tex>$hboxCl_2hbox--hboxAr$</tex>Inductively Coupled Plasma: Effect of Gas Mixing Ratio

IEEE Transactions on Plasma Science ◽

10.1109/tps.2004.828413 ◽

2004 ◽

Vol 32 (3) ◽

pp. 1344-1351 ◽

Cited By ~ 84

Author(s):

A.M. Efremov ◽

D.-P. Kim ◽

C.-I. Kim

Keyword(s):

Simple Model ◽

Inductively Coupled Plasma ◽

Mixing Ratio ◽

Gas Mixing ◽

Inductively Coupled ◽

Plasma Effect

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Etching Characteristics and Mechanism of SiNx Films for Nano-Devices in CH2F2/O2/Ar Inductively Coupled Plasma: Effect of O2 Mixing Ratio

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2014.10182 ◽

2014 ◽

Vol 14 (12) ◽

pp. 9534-9540 ◽

Cited By ~ 12

Author(s):

Jinyoung Son ◽

Alexander Efremov ◽

Sun Jin Yun ◽

Geun Young Yeom ◽

Kwang-Ho Kwon

Keyword(s):

Inductively Coupled Plasma ◽

Mixing Ratio ◽

Inductively Coupled ◽

Plasma Effect

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Langmuir probe potential measurements of an inductively coupled plasma: effect of radiofrequency and shield between load coil and plasma

Journal of Analytical Atomic Spectrometry ◽

10.1039/a801868e ◽

1998 ◽

Vol 13 (8) ◽

pp. 715-720 ◽

Cited By ~ 1

Author(s):

Chang J. Park ◽

Seung M. Noh

Keyword(s):

Langmuir Probe ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Probe Potential ◽

Plasma Effect

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<tex>$hboxCF _4$</tex>Decomposition Using Inductively Coupled Plasma: Effect of Power Frequency

IEEE Transactions on Industry Applications ◽

10.1109/tia.2004.840948 ◽

2005 ◽

Vol 41 (1) ◽

pp. 215-220 ◽

Cited By ~ 22

Author(s):

T. Kuroki ◽

J. Mine ◽

M. Okubo ◽

T. Yamamoto ◽

N. Saeki

Keyword(s):

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Power Frequency ◽

Plasma Effect

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Reduction of polyatomic interferences in inductively coupled plasma mass spectrometry by selection of instrumental parameters and using an argon–nitrogen plasma: effect on multi-element analyses

Journal of Analytical Atomic Spectrometry ◽

10.1039/ja9940900727 ◽

1994 ◽

Vol 9 (6) ◽

pp. 727-736 ◽

Cited By ~ 24

Author(s):

Francisco Laborda ◽

Malcolm J. Baxter ◽

Helen M. Crews ◽

John Dennis

Keyword(s):

Mass Spectrometry ◽

Inductively Coupled Plasma ◽

Nitrogen Plasma ◽

Inductively Coupled ◽

Plasma Mass Spectrometry ◽

Polyatomic Interferences ◽

Selection Of ◽

Plasma Effect

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Determination of Ultra-Trace Scandium, Yttrium and Rare-Earth Elements in High-Purity Iron by High-Resolution Inductively Coupled Plasma-Mass Spectrometry

Matériaux & Techniques ◽

10.1051/mattech/200391120031s ◽

2003 ◽

Vol 91 ◽

pp. 31-36 ◽

Cited By ~ 2

Author(s):

Tetsuya Ashino ◽

Kunio Takada ◽

Kazuaki Wagatsuma ◽

Kenji Abiko

Keyword(s):

Mass Spectrometry ◽

Rare Earth ◽

High Resolution ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Plasma Mass Spectrometry ◽

Purity Iron ◽

High Purity Iron ◽

Ultra Trace

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Potential novel diagnostic applications of laser ablation inductively coupled plasma mass spectrometry in trace metal imaging of hepatic metal disorders

Zeitschrift für Gastroenterologie ◽

10.1055/s-0033-1360941 ◽

2014 ◽

Vol 52 (01) ◽

Author(s):

R Weiskirchen ◽

R Uerlings ◽

A Zimmermann ◽

JS Becker

Keyword(s):

Mass Spectrometry ◽

Laser Ablation ◽

Trace Metal ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Plasma Mass Spectrometry ◽

Diagnostic Applications

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Quantification of hepatic liver iron overload with laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS)

10.1055/s-0038-1677110 ◽

2019 ◽

Author(s):

R Weiskirchen ◽

P Kim ◽

S Weiskirchen ◽

R Uerlings ◽

A Kueppers ◽

...

Keyword(s):

Mass Spectrometry ◽

Laser Ablation ◽

Iron Overload ◽

Inductively Coupled Plasma ◽

Liver Iron ◽

Inductively Coupled ◽

Icp Ms ◽

Liver Iron Overload ◽

Plasma Mass Spectrometry

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Determination of Heavy Metals in DietarySupplements by Inductively Coupled Plasma-Mass Spectrometry

Planta Medica ◽

10.1055/s-2008-1075330 ◽

2008 ◽

Vol 74 (03) ◽

Author(s):

B Avula ◽

Y-H Wang ◽

IA Khan

Keyword(s):

Mass Spectrometry ◽

Heavy Metals ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Plasma Mass Spectrometry

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