High Quality Silicon Oxide Film Formed by Diffusion Region PECVD and Oxygen Radical Treatment using Microwave-Excited High-Density Plasma
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2003 ◽
Vol 42
(Part 1, No. 4B)
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pp. 1911-1915
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2001 ◽
Vol 48
(8)
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pp. 1550-1555
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2011 ◽
Vol 11
(1)
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pp. S17-S20
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2002 ◽
Vol 20
(3)
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pp. 828
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2002 ◽
Vol 41
(Part 2, No. 7A)
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pp. L787-L789
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1993 ◽
Vol 64-65
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pp. 849-856
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1995 ◽
Vol 7
(14)
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pp. 2901-2907
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2018 ◽
Vol 54
(12)
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pp. 109
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