silica hydride
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Molecules ◽  
2021 ◽  
Vol 26 (24) ◽  
pp. 7505
Author(s):  
Joseph J. Pesek ◽  
Maria T. Matyska

This review describes the development, special features and applications of silica hydride-based stationary phases for HPLC. The unique surface of this material is in contrast to ordinary, standard silica, which is the material most frequently used in modern HPLC stationary phases. The standard silica surface contains mainly silanol (Si-OH) groups, while the silica hydride surface is instead composed of silicon-hydrogen groups, which is much more stable, less reactive and delivers different chromatographic and chemical characteristics. Other aspects of this material are described for each of the different bonded moieties available commercially. Some applications for each of these column types are also presented as well as a generic model for method development on silica hydride-based stationary phases.


Separations ◽  
2019 ◽  
Vol 6 (2) ◽  
pp. 27 ◽  
Author(s):  
Maria Matyska ◽  
Joseph Pesek

The development of a stationary phase material for high-performance liquid chromatography based on a surface of silica hydride as opposed to silanols on ordinary silica is discussed including synthetic approaches, characterization, and applications. There are several synthetic approaches available to create a silica hydride surface. Modification of the Si–H moiety on the silica surface can be accomplished through the use of a hydrosilation reaction. Both the intermediate silica hydride and the material modified with an organic moiety can be characterized by a number of spectroscopic as well as a variety of other methods. Further insights into the retention mechanism are provided through chromatographic measurements. The ultimate utility of any chromatographic stationary phase material is determined by its success in solving challenging analytical problems. A broad range of applications is reviewed to illustrate the versatility and usefulness of silica hydride-based stationary phases.


2019 ◽  
Vol 82 (6) ◽  
pp. 943-951 ◽  
Author(s):  
Chadin Kulsing ◽  
Yada Nolvachai ◽  
Reinhard I. Boysen ◽  
Maria T. Matyska ◽  
Joseph J. Pesek ◽  
...  

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