Electrical Properties and Thermal Stabilities of HfZrOx by Atomic Layer Deposition Technique for ULSI Application
2002 ◽
Vol 92
(11)
◽
pp. 6739-6742
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2017 ◽
Vol 691
◽
pp. 873-879
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2019 ◽
Vol 7
(19)
◽
pp. 5772-5781
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2015 ◽
Vol 177
◽
pp. 168-173
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