Electrical Properties and Thermal Stabilities of HfZrOx by Atomic Layer Deposition Technique for ULSI Application

2019 ◽  
Vol 3 (15) ◽  
pp. 99-105 ◽  
Author(s):  
You Min Jung ◽  
Sang Jin Lee ◽  
Ki Hoon Lee ◽  
Sang Kyu Lee ◽  
Tea Wook Seo
Author(s):  
Lukasz Wachnicki ◽  
Sylwia Gieraltowska ◽  
Bartlomiej S. Witkowski ◽  
Marek Godlewski ◽  
Michal M. Godlewski ◽  
...  

2002 ◽  
Vol 92 (11) ◽  
pp. 6739-6742 ◽  
Author(s):  
J. B. Kim ◽  
D. R. Kwon ◽  
K. Chakrabarti ◽  
Chongmu Lee ◽  
K. Y. Oh ◽  
...  

2019 ◽  
Vol 7 (19) ◽  
pp. 5772-5781 ◽  
Author(s):  
Yujie Zhao ◽  
Liangjun Yin ◽  
O. M. ten Kate ◽  
Benjamin Dierre ◽  
Ruben Abellon ◽  
...  

Enhanced thermal degradation stability of the Sr2Si5N8:Eu2+ phosphor by ultra-thin Al2O3 coating through FB-ALD.


Sign in / Sign up

Export Citation Format

Share Document