Measurement of the properties of MetalMUMPS® thin films

The metal multi-user micro-electro-mechanical-systems (MEMS) processes (MetalMUMPs®) micro-machining process includes two silicon nitride films, one polysilicon film, and one nickel film for constructing various MEMS devices. This thesis presents property measurements of the metalMUMPs® silicon nitride and nickel films. Fabricated MetalMUMPs® silicon nutride prototypes were used to experimentally determine a Young’s modulus of 209 GPa and a residual stress difference of 169 MPa for the silicon nitride films. A method, which uses the deformations along the width of bi-layered cantilever beams, was proposed to determine the residual stress difference of the two silicon nitride films. Fabricated MetalMUMPs® nickel prototypes were used to experimentally extract a Young’s modulus of 159 GPa and a residual stress gradient of -4.72 MPa/m for the nickel film. A micro bridge mechanism was developed to lift long silicon nitride beams for the determination of the residual stress difference of the two silicon nitride films.

Measurement of the properties of MetalMUMPS® thin films

The metal multi-user micro-electro-mechanical-systems (MEMS) processes (MetalMUMPs®) micro-machining process includes two silicon nitride films, one polysilicon film, and one nickel film for constructing various MEMS devices. This thesis presents property measurements of the metalMUMPs® silicon nitride and nickel films. Fabricated MetalMUMPs® silicon nutride prototypes were used to experimentally determine a Young’s modulus of 209 GPa and a residual stress difference of 169 MPa for the silicon nitride films. A method, which uses the deformations along the width of bi-layered cantilever beams, was proposed to determine the residual stress difference of the two silicon nitride films. Fabricated MetalMUMPs® nickel prototypes were used to experimentally extract a Young’s modulus of 159 GPa and a residual stress gradient of -4.72 MPa/m for the nickel film. A micro bridge mechanism was developed to lift long silicon nitride beams for the determination of the residual stress difference of the two silicon nitride films.

[24]Crown-8-modified carbon nanotubes for templating metal deposition and active materials for pseudocapacitors

A uniform nickel film could be coated on crown ether-modified carbon nanotubes (c-CNTs) by electroless deposition.

LARGE VALUES OF THE TRANSVERSE M UES OF THE TRANSVERSE MAGNETIC RESISTANCEOF SINGLE CRYSTAL NICKEL FILMS

Background. The anisotropy of the transverse magnetoresistance of single-crystal nickel films was studied in this work. The measurements were carried out on samples whose surface plane coincided with the [001] plane. Studies of the magnetoresistance in a single-crystal nickel film have shown the effect of tensile stresses acting on it from the side of magnesium oxide. The modification of the anisotropy of magnetoreflection of a film on a substrate as compared to a free sample is apparently associated with a change in the shape of the Fermi surface of carriers.