Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array

2022 ◽  
Vol 142 (1) ◽  
pp. 15-16
Author(s):  
Takeshi Onodera ◽  
Kengo Mieda ◽  
Kazuma Taniguchi
Keyword(s):  
Self Assembly ◽  
Nanosphere Lithography ◽  
Nanohole Array

Surface plasmon modes of nanomesh-on-mirror nanocavities prepared by nanosphere lithography

Nanoscale ◽  
2018 ◽  
Vol 10 (37) ◽  
pp. 17983-17989 ◽  
Author(s):  
Christian Stelling ◽  
Stefan Fossati ◽  
Jakub Dostalek ◽  
Markus Retsch
Keyword(s):  
Surface Plasmon ◽  
Self Assembly ◽  
Nanosphere Lithography ◽  
Analytical Theory ◽  
Narrow Gap ◽  
Metal Insulator ◽  
Metal Structures ◽  
Metal Insulator Metal ◽  
Plasmon Modes

Metal–insulator–metal structures prepared by self-assembly exhibit narrow gap plasmon modes, which are fully described by analytical theory.

Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography

2020 ◽  
Vol 12 (10) ◽  
pp. 12345-12352 ◽  
Author(s):  
Xiaoguo Fang ◽  
Changxiong Zheng ◽  
Zhen Yin ◽  
Zhenming Wang ◽  
Jiawei Wang ◽  
...  
Keyword(s):  
Self Assembly ◽  
Nanosphere Lithography

Tunable Graphene Metasurfaces with Gradient Features by Self-Assembly-Based Moiré Nanosphere Lithography

2016 ◽  
Vol 4 (12) ◽  
pp. 2035-2043 ◽  
Author(s):  
Zilong Wu ◽  
Wei Li ◽  
Maruthi Nagavalli Yogeesh ◽  
Seungyong Jung ◽  
Alvin Lynghi Lee ◽  
...  
Keyword(s):  
Self Assembly ◽  
Nanosphere Lithography

scholarly journals Tailoring plasmonic properties of gold nanohole arrays for surface-enhanced Raman scattering

2015 ◽  
Vol 17 (33) ◽  
pp. 21211-21219 ◽  
Author(s):  
Peng Zheng ◽  
Scott K. Cushing ◽  
Savan Suri ◽  
Nianqiang Wu
Keyword(s):  
Raman Scattering ◽  
Tuning Range ◽  
Nanosphere Lithography ◽  
Surface Enhanced Raman Scattering ◽  
Nanohole Array ◽  
Surface Enhanced ◽  
Nanohole Arrays ◽  
Surface Enhanced Raman ◽  
Enhanced Raman Scattering ◽  
Plasmonic Tuning

The wide plasmonic tuning range of nanotriangle and nanohole array patterns fabricated by nanosphere lithography makes them promising in surface-enhanced Raman scattering (SERS) sensors.

A template-assisted self-organization process for the formation of a linear arrangement of pairs of metallic tips

2014 ◽  
Vol 1663 ◽  
Author(s):  
Katharina Brassat ◽  
Jörg K.N. Lindner
Keyword(s):  
Silicon Wafer ◽  
Self Assembly ◽  
Nanosphere Lithography ◽  
Self Organization ◽  
Shadow Mask ◽  
Linear Arrangement ◽  
Polystyrene Beads ◽  
Surface Fraction ◽  
Organization Process ◽  
Sphere Arrangement

ABSTRACTA novel process for the formation of pairs of opposing metallic nanotips within linear trenches on a silicon wafer is investigated in detail. The process is based on a spreading knife technique typically used in nanosphere lithography to generate monolayers of colloidal polystyrene beads. Here it is applied to initiate self-assembly of spheres in long linear trenches acting as a template for the sphere arrangement. The optimum blade velocity to deposit the spheres selectively and densely packed in the trench depends on the trench surface fraction and can be described by a modified Dimitrov model. It is demonstrated that the spheres can be used as a shadow mask to deposit metallic nanotips in a channel, which are electrically interconnected on each side of the trench, possibly enabling the control and manipulation of nanoobjects in the channel.

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