ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization
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Published By American Chemical Society

0841209340, 0841211272

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X-ray Photoelectron Spectroscopy Applied to Microelectronic Materials

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch008 ◽

1986 ◽

pp. 144-162

Author(s):

William F. Stickle ◽

Kenneth D. Bomben

Keyword(s):

Photoelectron Spectroscopy ◽

X Ray ◽

Microelectronic Materials

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Applications of Auger Electron Spectroscopy in Microelectronics

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch007 ◽

1986 ◽

pp. 118-143 ◽

Author(s):

Paul A. Lindfors ◽

Ronald W. Kee ◽

Douglas L. Jones

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

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Effects of Various Chemistries on Silicon-Wafer Cleaning

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch023 ◽

1986 ◽

pp. 366-376 ◽

Author(s):

D. Scott Becker ◽

William R. Schmidt ◽

Charlie A. Peterson ◽

Don C. Burkman

Keyword(s):

Silicon Wafer ◽

Wafer Cleaning ◽

Silicon Wafer Cleaning

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Characterization of Spin-On Glass Films as a Planarizing Dielectric

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch022 ◽

1986 ◽

pp. 349-365 ◽

Author(s):

Satish K. Gupta ◽

Roland L. Chin

Keyword(s):

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Thermal-Wave Measurement of Thin-Film Thickness

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch010 ◽

1986 ◽

pp. 181-191

Author(s):

Allan Rosencwaig

Keyword(s):

Thin Film ◽

Film Thickness ◽

Thermal Wave ◽

Thin Film Thickness ◽

Wave Measurement ◽

Thermal Wave Measurement

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Scanning Electron Microscopic Techniques for Characterization of Semiconductor Materials

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch004 ◽

1986 ◽

pp. 49-74 ◽

Author(s):

Rodney A. Young ◽

Ronald V. Kalin

Keyword(s):

Semiconductor Materials ◽

Electron Microscopic ◽

Scanning Electron Microscopic ◽

Microscopic Techniques ◽

Scanning Electron

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Characterization of Components in Plasma Phosphorus-Doped Oxides

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch020 ◽

1986 ◽

pp. 320-332

Author(s):

Jana Houskova ◽

Kim-Khanh N. Ho ◽

Marjorie K. Balazs

Keyword(s):

Phosphorus Doped ◽

Plasma Phosphorus

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PREFACE

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.pr001 ◽

1986 ◽

pp. ix-x

Author(s):

LAWRENCE A. CASPER

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Analytical Approaches and Expert Systems in the Characterization of Microelectronic Devices

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch001 ◽

1986 ◽

pp. 1-17 ◽

Author(s):

D. E. Passoja ◽

Lawrence A. Casper ◽

A. J. Scharman

Keyword(s):

Expert Systems ◽

Microelectronic Devices ◽

Analytical Approaches

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Materials Characterization Using Elemental and Isotopic Analyses by Inductively Coupled Plasma Mass Spectrometry

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch017 ◽

1986 ◽

pp. 284-293 ◽

Author(s):

B. Shushan ◽

E. S. K. Quan ◽

A. Boorn ◽

D. J. Douglas ◽

G. Rosenblatt

Keyword(s):

Mass Spectrometry ◽

Inductively Coupled Plasma ◽

Materials Characterization ◽

Inductively Coupled ◽

Isotopic Analyses ◽

Plasma Mass Spectrometry

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