2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers.
Latest Publications

TOTAL DOCUMENTS

169

(FIVE YEARS 0)

H-INDEX

(FIVE YEARS 0)

Published By Japan Soc. Appl. Phys

4891140313

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178637 ◽

2003 ◽

Author(s):

H.L. Chen ◽

W.C. Chao ◽

F.H. Ko ◽

T.C. Chu ◽

H.C. Cheng

Keyword(s):

Dielectric Constant ◽

Low Dielectric Constant ◽

Antireflective Coating ◽

Low Dielectric ◽

Low Dielectric Constant Materials ◽

Coating Layers

Download Full-text

157nm resist material design for improvement of its transparency by using highly precise theoretical calculation

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178635 ◽

2003 ◽

Author(s):

T. Yamazaki ◽

T. Itani

Keyword(s):

Theoretical Calculation ◽

Material Design

Download Full-text

Micro hot embossing for replication of micro structures

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178593 ◽

2003 ◽

Author(s):

X.C. Shan ◽

Y. Murakoshi ◽

R. Maeda

Keyword(s):

Hot Embossing ◽

Micro Structures

Download Full-text

Effects of improved microchannel structures to the separation characteristics of microchip capillary electrophoresis

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178601 ◽

2003 ◽

Cited By ~ 1

Author(s):

Y. Utsumi ◽

M. Ozaki ◽

S. Tereabe ◽

T. Hattori

Keyword(s):

Capillary Electrophoresis ◽

Microchip Capillary Electrophoresis

Download Full-text

Fabrication of high accuracy micro-translation-table for near-field optical data storage actuated by inverted-scratch-drive-actuators

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178665 ◽

2003 ◽

Cited By ~ 1

Author(s):

Y. Kanamori ◽

H. Yahagi ◽

T. Ono ◽

M. Sasaki ◽

K. Hane

Keyword(s):

Data Storage ◽

Near Field ◽

High Accuracy ◽

Optical Data Storage ◽

Optical Data ◽

Translation Table

Download Full-text

Fabrication of a GaAs emitter with a high aspect ratio for generation of prebunched electron beam using Gunn effect

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178615 ◽

2003 ◽

Author(s):

H. Hasegawa ◽

H. Mimura ◽

K. Yokoo

Keyword(s):

Electron Beam ◽

Aspect Ratio ◽

High Aspect Ratio ◽

Gunn Effect

Download Full-text

Pattern defects of nanoimprint in atmospheric conditions

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178524 ◽

2003 ◽

Author(s):

H. Hiroshima ◽

M. Komuro ◽

N. Kasahara ◽

Y. Kurashima ◽

J. Taniguchi ◽

...

Keyword(s):

Atmospheric Conditions

Download Full-text

Characterization of line edge roughness in resist patterns by Fourier analysis and auto-correlation function

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178553 ◽

2003 ◽

Author(s):

A. Yamaguchi ◽

O. Komuro

Keyword(s):

Correlation Function ◽

Fourier Analysis ◽

Line Edge Roughness ◽

Auto Correlation ◽

Edge Roughness ◽

Auto Correlation Function

Download Full-text

Influence of intentionally strained sapphire substrate on GaN epilayers

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178628 ◽

2003 ◽

Author(s):

Jaekyun Kim ◽

Young Ju Park ◽

Dongjin Byun ◽

Eui Kwan Koh ◽

Eun Kyu Kim ◽

...

Keyword(s):

Sapphire Substrate

Download Full-text

Alternating phase shifting mask in EUV lithography

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

10.1109/imnc.2002.1178563 ◽

2003 ◽

Author(s):

M. Sugawara ◽

A. Chiba ◽

H. Yamanashi ◽

I. Nishiyama

Keyword(s):

Phase Shifting ◽

Euv Lithography

Download Full-text

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers.Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Japan Soc. Appl. Phys

Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography

157nm resist material design for improvement of its transparency by using highly precise theoretical calculation

Micro hot embossing for replication of micro structures

Effects of improved microchannel structures to the separation characteristics of microchip capillary electrophoresis

Fabrication of high accuracy micro-translation-table for near-field optical data storage actuated by inverted-scratch-drive-actuators

Fabrication of a GaAs emitter with a high aspect ratio for generation of prebunched electron beam using Gunn effect

Pattern defects of nanoimprint in atmospheric conditions

Characterization of line edge roughness in resist patterns by Fourier analysis and auto-correlation function

Influence of intentionally strained sapphire substrate on GaN epilayers

Alternating phase shifting mask in EUV lithography

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers.
Latest Publications