Praseodymium Silicate as a High-kDielectric Candidate: An Insight into the Pr2O3-Film/Si-Substrate Interface Fabricated Through a Metal-Organic Chemical Vapor Deposition Process

2005 ◽  
Vol 15 (5) ◽  
pp. 838-845 ◽  
Author(s):  
R. Lo Nigro ◽  
R. G. Toro ◽  
G. Malandrino ◽  
G. G. Condorelli ◽  
V. Raineri ◽  
...  
CrystEngComm ◽  
2020 ◽  
Vol 22 (7) ◽  
pp. 1160-1165 ◽  
Author(s):  
Yingnan Huang ◽  
Jianxun Liu ◽  
Xiujian Sun ◽  
Xiaoning Zhan ◽  
Qian Sun ◽  
...  

We reported the successful growth of a crack-free high-quality 2 μm-thick Al0.5Ga0.5N film with a smooth surface grown on planar Si by metal–organic chemical vapor deposition.


2005 ◽  
Vol 250 (1-4) ◽  
pp. 280-283 ◽  
Author(s):  
Yu-Jia Zeng ◽  
Zhi-Zhen Ye ◽  
Wei-Zhong Xu ◽  
Li-Ping Zhu ◽  
Bing-Hui Zhao

2015 ◽  
Vol 578 ◽  
pp. 180-184 ◽  
Author(s):  
Colin Georgi ◽  
Marko Hapke ◽  
Indre Thiel ◽  
Alexander Hildebrandt ◽  
Thomas Waechtler ◽  
...  

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