Remote hydrogen plasma chemical vapor deposition of silicon-carbon thin-film materials from a hexamethyldisilane source: Characterization of the process and the deposits

2002 ◽  
Vol 86 (6) ◽  
pp. 1445-1458 ◽  
Author(s):  
A. M. Wróbel ◽  
A. Walkiewicz-Pietrzykowska ◽  
J. E. Klemberg-Sapieha ◽  
Y. Hatanaka ◽  
T. Aoki ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Source Characterization ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Carbon

Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films

2003 ◽  
Vol 15 (8) ◽  
pp. 1749-1756 ◽  
Author(s):  
A. M. Wróbel ◽  
A. Walkiewicz-Pietrzykowska ◽  
J. E. Klemberg-Sapieha ◽  
Y. Nakanishi ◽  
T. Aoki ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Hydrogen Plasma ◽  
Morphological Structure ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Carbon ◽  
Kinetics Of

Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 2. Property−Structure Relationships for Resulting Silicon−Carbon Films

2003 ◽  
Vol 15 (8) ◽  
pp. 1757-1762 ◽  
Author(s):  
A. M. Wróbel ◽  
A. Walkiewicz-Pietrzykowska ◽  
D. M. Bieliński ◽  
J. E. Klemberg-Sapieha ◽  
Y. Nakanishi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Carbon

Thin film characterization of diamond-like carbon films prepared by r.f. plasma chemical vapor deposition

1997 ◽  
Vol 302 (1-2) ◽  
pp. 5-11 ◽  
Author(s):  
Kenji K. Hirakuri ◽  
Takumi Minorikawa ◽  
Gernot Friedbacher ◽  
Manfred Grasserbauer
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Thin Film Characterization

Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

1999 ◽  
Vol 354 (1-2) ◽  
pp. 24-28 ◽  
Author(s):  
K.K. Chattopadhyay ◽  
S. Matsumoto ◽  
Y.-F. Zhang ◽  
I. Sakaguchi ◽  
M. Nishitani-Gamo ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Cubic Boron Nitride ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Inductively Coupled ◽  
Film Synthesis

scholarly journals Synthesis of Multiwalled Carbon Nanotubes on Stainless Steel by Atmospheric Pressure Microwave Plasma Chemical Vapor Deposition

2020 ◽  
Vol 10 (13) ◽  
pp. 4468 ◽  
Author(s):  
Dashuai Li ◽  
Ling Tong ◽  
Bo Gao
Keyword(s):  
Carbon Nanotubes ◽  
Stainless Steel ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Microwave Plasma ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

In this paper, we synthesize carbon nanotubes (CNTs) by using atmospheric pressure microwave plasma chemical vapor deposition (AMPCVD). In AMPCVD, a coaxial plasma generator provides 200 W 2.45 GHz microwave plasma at atmospheric pressure to decompose the precursor. A high-temperature tube furnace provides a suitable growth temperature for the deposition of CNTs. Optical fiber spectroscopy was used to measure the compositions of the argon–ethanol–hydrogen plasma. A comparative experiment of ethanol precursor decomposition, with and without plasma, was carried out to measure the role of the microwave plasma, showing that the 200 W microwave plasma can decompose 99% of ethanol precursor at any furnace temperature. CNTs were prepared on a stainless steel substrate by using the technology to decompose ethanol with the plasma power of 200 W at the temperatures of 500, 600, 700, and 800 °C; CNT growth increases with the increase in temperature. Prepared CNTs, analyzed by SEM and HRTEM, were shown to be multiwalled and tangled with each other. The measurement of XPS and Raman spectroscopy indicates that many oxygenated functional groups have attached to the surface of the CNTs.

scholarly journals Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon-Carbon and Silica Films from Organosilicon Sources.

2001 ◽  
Vol 13 (8) ◽  
pp. 2742-2742 ◽  
Author(s):  
A. M. Wróbel ◽  
A. Walkiewicz-Pietrzykowska ◽  
Y. Hatanaka ◽  
S. Wickramanayaka ◽  
Y. Nakanishi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Remote Plasma ◽  
Plasma Chemical ◽  
Silica Films ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Carbon
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