Photoionization Mass Spectrometry and Valence Photoelectron-Photoion Coincidence Spectroscopy of Isolated Clusters in a Molecular Beam

1989 ◽  
Vol 93 (6) ◽  
pp. 653-670 ◽  
Author(s):  
Klaus Rademann
1993 ◽  
Vol 334 ◽  
Author(s):  
I.B. Graff ◽  
R.A. Pugliese ◽  
P.R. Westmoreland

AbstractMolecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.


2020 ◽  
Vol 34 (10) ◽  
pp. 12678-12687 ◽  
Author(s):  
Ke Yang ◽  
Jiahao Wang ◽  
Jiahui Huang ◽  
Jiuzhong Yang ◽  
Yang Pan ◽  
...  

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