Simulation of individual particle movement in a gravel streambed

2002 ◽  
Vol 27 (1) ◽  
pp. 81-97 ◽  
Author(s):  
J. Mikael Malmaeus ◽  
Marwan A. Hassan
2020 ◽  
Vol 264 ◽  
pp. 109674 ◽  
Author(s):  
S. Keppler ◽  
S. O'Meara ◽  
S. Bakalis ◽  
P.J. Fryer ◽  
G.M. Bornhorst

Author(s):  
Karen A. Katrinak ◽  
David W. Brekke ◽  
John P. Hurley

Individual-particle analysis is well established as an alternative to bulk analysis of airborne particulates. It yields size and chemical data on a particle-by-particle basis, information that is critical in predicting the behavior of air pollutants. Individual-particle analysis is especially important for particles with diameter < 1 μm, because particles in this size range have a disproportionately large effect on atmospheric visibility and health.


2004 ◽  
Vol 471-472 ◽  
pp. 26-31 ◽  
Author(s):  
Jian Xiu Su ◽  
Dong Ming Guo ◽  
Ren Ke Kang ◽  
Zhu Ji Jin ◽  
X.J. Li ◽  
...  

Chemical mechanical polishing (CMP) has already become a mainstream technology in global planarization of wafer, but the mechanism of nonuniform material removal has not been revealed. In this paper, the calculation of particle movement tracks on wafer surface was conducted by the motion relationship between the wafer and the polishing pad on a large-sized single head CMP machine. Based on the distribution of particle tracks on wafer surface, the model for the within-wafer-nonuniformity (WIWNU) of material removal was put forward. By the calculation and analysis, the relationship between the motion variables of the CMP machine and the WIWNU of material removal on wafer surface had been derived. This model can be used not only for predicting the WIWNU, but also for providing theoretical guide to the design of CMP equipment, selecting the motion variables of CMP and further understanding the material removal mechanism in wafer CMP.


2019 ◽  
Vol 21 (4) ◽  
Author(s):  
Nishant Kumar ◽  
Bettina Suhr ◽  
Stefan Marschnig ◽  
Peter Dietmaier ◽  
Christof Marte ◽  
...  

Abstract Ballasted tracks are the commonly used railway track systems with constant demands for reducing maintenance cost and improved performance. Elastic layers are increasingly used for improving ballasted tracks. In order to better understand the effects of elastic layers, physical understanding at the ballast particle level is crucial. Here, discrete element method (DEM) is used to investigate the effects of elastic layers – under sleeper pad ($$\text {USP}$$USP) at the sleeper/ballast interface and under ballast mat ($$\text {UBM}$$UBM) at the ballast/bottom interface – on micro-mechanical behavior of railway ballast. In the DEM model, the Conical Damage Model (CDM) is used for contact modelling. This model was calibrated in Suhr et al. (Granul Matter 20(4):70, 2018) for the simulation of two different types of ballast. The CDM model accounts for particle edge breakage, which is an important phenomenon especially at the early stage of a tamping cycle, and thus essential, when investigating the impact of elastic layers in the ballast bed. DEM results confirm that during cyclic loading, $$\text {USP}$$USP reduces the edge breakage at the sleeper/ballast interface. On the other hand, $$\text {UBM}$$UBM shows higher particle movement throughout the ballast bed. Both the edge breakage and particle movement in the ballast bed are found to influence the sleeper settlement. Micro-mechanical investigations show that the force chain in deeper regions of the ballast bed is less affected by $$\text {USP}$$USP for the two types of ballast. Conversely, dense lateral forces near to the box bottom were seen with $$\text {UBM}$$UBM. The findings are in good (qualitative) agreement with the experimental observations. Thus, DEM simulations can aid to better understand the micro-macro phenomena for railway ballast. This can help to improve the track components and track design based on simulation models taking into account the physical behavior of ballast. Graphical Abstract


1968 ◽  
Vol 1 (2) ◽  
pp. 185-186
Author(s):  
YOSHIRO MORI ◽  
KOZO NAKAMURA

1999 ◽  
Vol 59 (5) ◽  
pp. 379-388 ◽  
Author(s):  
M H Nasim ◽  
Arshad M Mirza ◽  
G Murtaza ◽  
P K Shukla

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