scholarly journals Solvent Vapor Annealing of a Diblock Copolymer Thin Film with a Nonselective and a Selective Solvent: Importance of Pathway for the Morphological Changes

2020 ◽  
Vol 41 (14) ◽  
pp. 2000150 ◽  
Author(s):  
Florian A. Jung ◽  
Anatoly V. Berezkin ◽  
Tim B. Tejsner ◽  
Dorthe Posselt ◽  
Detlef‐M. Smilgies ◽  
...  
Keyword(s):  
Thin Film ◽  
Diblock Copolymer ◽  
Morphological Changes ◽  
Selective Solvent ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

scholarly journals Solvent Vapor Annealing: Bistetracene Thin Film Polymorphic Control to Unravel the Effect of Molecular Packing on Charge Transport (Adv. Mater. Interfaces 9/2018)

2018 ◽  
Vol 5 (9) ◽  
pp. 1870040
Author(s):  
Edmund K. Burnett ◽  
Jack Ly ◽  
Muhammad R. Niazi ◽  
Lei Zhang ◽  
Samantha R. McCuskey ◽  
...  
Keyword(s):  
Thin Film ◽  
Charge Transport ◽  
Molecular Packing ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

scholarly journals Effects of Solvent Vapor Annealing on Morphology and Charge Transport of Poly(3-hexylthiophene) (P3HT) Films Incorporated with Preformed P3HT Nanowires

Polymers ◽  
2020 ◽  
Vol 12 (5) ◽  
pp. 1188
Author(s):  
Mingu Jang ◽  
Yang-Il Huh ◽  
Mincheol Chang
Keyword(s):  
Thin Films ◽  
Charge Transport ◽  
Carrier Mobility ◽  
Morphological Changes ◽  
Charge Carrier Mobility ◽  
Solvent Vapor ◽  
Molecular Ordering ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing ◽  
Influence Of Solvent

We systematically studied the influence of solvent vapor annealing on the molecular ordering, morphologies, and charge transport properties of poly(3-hexylthiophene) (P3HT) thin films embedded with preformed crystalline P3HT nanowires (NWs). Solvent vapor annealing (SVA) with chloroform (CF) was found to profoundly impact on the structural and morphological changes, and thus on the charge transport characteristics, of the P3HT-NW-embedded P3HT films. With increased annealing time, the density of crystalline P3HT NWs was increased within the resultant films, and also intra- and intermolecular interactions of the corresponding films were significantly improved. As a result, the P3HT-NW-embedded P3HT films annealed with CF vapor for 20 min resulted in a maximized charge carrier mobility of ~0.102 cm2 V−1 s−1, which is higher than that of pristine P3HT films by 4.4-fold (μ = ~0.023 cm2 V−1 s−1).

Fabrication and Thermal Insulation Properties of Bamboo-Shaped Polymer Fibers by Selective Solvent Vapor Annealing

2018 ◽  
Vol 39 (23) ◽  
pp. 1800424 ◽  
Author(s):  
Yu-Jing Chiu ◽  
Han-Lun Chiu ◽  
Hsiao-Fan Tseng ◽  
Bo-Hao Wu ◽  
Jia-Wei Li ◽  
...  
Keyword(s):  
Thermal Insulation ◽  
Polymer Fibers ◽  
Selective Solvent ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Controlled solvent vapor annealing of a high χ block copolymer thin film

2017 ◽  
Vol 19 (4) ◽  
pp. 2805-2815 ◽  
Author(s):  
Ross Lundy ◽  
Shauna P. Flynn ◽  
Cian Cummins ◽  
Susan M. Kelleher ◽  
Maurice N. Collins ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Solvent Vapor ◽  
Wafer Scale ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Wafer scale high χ block copolymer patterning via dynamic solvent vapor annealing.

scholarly journals Controlling PCBM aggregation in P3HT/PCBM film by a selective solvent vapor annealing

2013 ◽  
Vol 58 (22) ◽  
pp. 2767-2774 ◽  
Author(s):  
Yue Sun ◽  
YanChun Han ◽  
JianGang Liu
Keyword(s):  
Selective Solvent ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly

2017 ◽  
Vol 55 (15) ◽  
pp. 1125-1130 ◽  
Author(s):  
Brian C. Stahl ◽  
Edward J. Kramer ◽  
Craig J. Hawker ◽  
Nathaniel A. Lynd
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Snake Tracks in Polymer Land: Wavy Polymer Structures via Selective Solvent Vapor Annealing

Langmuir ◽  
2020 ◽  
Vol 36 (33) ◽  
pp. 9780-9785
Author(s):  
Yu-Jing Chiu ◽  
Chang-Ching Weng ◽  
Hsiao-Fan Tseng ◽  
Hsun-Hao Hsu ◽  
Jiun-Tai Chen
Keyword(s):  
Selective Solvent ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

scholarly journals Segregation of Maghemite Nanoparticles within Symmetric Diblock Copolymer and Triblock Terpolymer Patterns under Solvent Vapor Annealing

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1286
Author(s):  
George Zapsas ◽  
Dimitrios Moschovas ◽  
Konstantinos Ntetsikas ◽  
Andreas Karydis-Messinis ◽  
Nikolaos Chalmpes ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Maghemite Nanoparticles ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
The Matrix ◽  
Solvent Vapor Annealing ◽  
Selective Placement

Block copolymers (BCPs), through their self-assembly, provide an excellent guiding platform for precise controlled localization of maghemite nanoparticles (MNPs). Diblock copolymers (di/BCP) represent the most applied matrix to host filler components due to their morphological simplicity. A series of nanocomposites based on diblock copolymer or triblock terpolymer matrices and magnetic nanoparticles were prepared to study and compare the influence of an additional block into the BCP matrix. MNPs were grafted with low molecular weight polystyrene (PS) chains in order to be segregated in a specific phase of the matrix to induce selective localization. After the mixing of the BCPs with 10% w/v PS-g-MNPs, nanocomposite thin films were formed by spin coating. Solvent vapor annealing (SVA) enabled the PS-g-MNPs selective placement within the PS domains of the BCPs, as revealed by atomic force microscopy (AFM). The recorded images have proven that high amounts of functionalized MNPs can be controllably localized within the same block (PS), despite the architecture of the BCPs (AB vs. ABC). The adopted lamellar structure of the “neat” BCP thin films was maintained for MNPs loading approximately up to 10% w/v, while, for higher content, the BCP adopted lamellar morphology is partially disrupted, or even disappears for both AB and ABC architectures.

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