In Situ Monitoring of Cu(In1−x,Gax)Se2Composition and Target Poisoning by Real Time Optical Emission Spectroscopy During Deposition From a Hybrid Sputtering/Evaporation Process

2016 ◽  
Vol 13 (10) ◽  
pp. 997-1007 ◽  
Author(s):  
Jorge Posada ◽  
Angélique Bousquet ◽  
Marie Jubault ◽  
Daniel Lincot ◽  
Eric Tomasella
Keyword(s):  
Real Time ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
In Situ Monitoring ◽  
Evaporation Process

scholarly journals Machine Learning Prediction of Electron Density and Temperature from Optical Emission Spectroscopy in Nitrogen Plasma

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song
Keyword(s):  
Machine Learning ◽  
Electron Temperature ◽  
Real Time ◽  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Plasma Nitridation

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.

In Situ Monitoring of GaN Reactive Ion Etching by Optical Emission Spectroscopy

2001 ◽  
Vol 40 (Part 2, No. 4A) ◽  
pp. L313-L315 ◽  
Author(s):  
Harumasa Yoshida ◽  
Tatsuhiro Urushido ◽  
Hideto Miyake ◽  
Kazumasa Hiramatsu
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Reactive Ion Etching ◽  
Optical Emission ◽  
In Situ Monitoring ◽  
Ion Etching

In-situ optical emission spectroscopy for a better control of hybrid sputtering/evaporation process for the deposition of Cu(In,Ga)Se 2 layers

2015 ◽  
Vol 582 ◽  
pp. 279-283 ◽  
Author(s):  
Jorge Posada ◽  
Marie Jubault ◽  
Angélique Bousquet ◽  
Eric Tomasella ◽  
Daniel Lincot
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Evaporation Process
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