Moisture barrier films containing plasma polymer fluorocarbon/inorganic multilayers fabricated via continuous roll-to-roll sputtering

2018 ◽  
Vol 15 (7) ◽  
pp. 1700221
Author(s):  
Sung Hyun Kim ◽  
Mac Kim ◽  
Jae Heung Lee ◽  
Sang-Jin Lee
Keyword(s):  
Plasma Polymer ◽  
Moisture Barrier ◽  
Barrier Films ◽  
Roll To Roll

scholarly journals Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers

2015 ◽  
Vol 13 (3) ◽  
pp. 311-315 ◽  
Author(s):  
Sergey A. Starostin ◽  
Wytze Keuning ◽  
Jean-Paul Schalken ◽  
Mariadriana Creatore ◽  
Wilhelmus M. M. Erwin Kessels ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Moisture Barrier ◽  
Barrier Films ◽  
Roll To Roll

scholarly journals Towards Roll-to-Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process

2014 ◽  
Vol 12 (6) ◽  
pp. 545-554 ◽  
Author(s):  
Sergey A. Starostin ◽  
Mariadriana Creatore ◽  
Jan B. Bouwstra ◽  
Mauritius C. M. van de Sanden ◽  
Hindrik W. de Vries
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
High Quality ◽  
Moisture Barrier ◽  
Barrier Films ◽  
Pressure Plasma ◽  
Roll To Roll

scholarly journals The role of carrier gas flow in roll-to-roll AP-PECVD synthesized silica moisture barrier films

2018 ◽  
Vol 339 ◽  
pp. 20-26 ◽  
Author(s):  
A.S. Meshkova ◽  
F.M. Elam ◽  
S.A. Starostin ◽  
M.C.M. van de Sanden ◽  
H.W. de Vries
Keyword(s):  
Gas Flow ◽  
Moisture Barrier ◽  
Carrier Gas ◽  
Barrier Films ◽  
Roll To Roll ◽  
Carrier Gas Flow

Room Temperature Deposition of SiNx and Plasma Polymer Layers for Flexible Multilayer Barrier Films by Plasma Enhanced Chemical Vapor Deposition Processes

NANO ◽  
2018 ◽  
Vol 13 (07) ◽  
pp. 1850082 ◽  
Author(s):  
Sang Heon Yong ◽  
Hyung June Ahn ◽  
Sun Jung Kim ◽  
Jang Soon Park ◽  
Sungyool Kwon ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Room Temperature ◽  
Layer Structure ◽  
Transmission Rate ◽  
Single Layer ◽  
Chemical Vapor ◽  
Barrier Property ◽  
Plasma Polymer ◽  
Moisture Barrier ◽  
Barrier Films

In this work, silicon nitride (SiNx) films were deposited on plastic substrates at room temperature close to 30[Formula: see text]C on polyethylenenaphthalate (PEN) films in an inductively coupled plasma (ICP) reactor with trisilylamine (TSA, N(SiH[Formula: see text]) precursor and ammonia for flexible moisture barrier films. Moisture barrier property is improved as SiNx layer gets thicker, but cracks are found at thicker films above 300[Formula: see text]nm or more. And the barrier performance of the thicker layers is degraded significantly. In order to improve both flexibility and barrier property, plasma polymer (PP) layers were deposited at room temperature and introduced between the SiNx layers. The water vapor transmission rate (WVTR) of a single SiNx film, [Formula: see text][Formula: see text]g/(m[Formula: see text]), is reduced to [Formula: see text][Formula: see text]g/(m[Formula: see text]) with SiNx/PP/SiNx/PP/SiNx alternating five-layer structure. After 1000 times bending in 1.5[Formula: see text]cm of bending radius, the WVTR increases by 41% with five-layer structure, while that of single-layer structure increases by 69%. This work demonstrated that the SiNx and PP layers can be deposited at room temperature for flexible moisture barrier films.

Enhanced moisture-barrier property of a hybrid nanolaminate composed of aluminum oxide and plasma polymer

2014 ◽  
Vol 134 ◽  
pp. 142-145 ◽  
Author(s):  
Seung-Woo Seo ◽  
Kyu-Hyun Hwang ◽  
Eun Jung ◽  
Sang Joon Seo ◽  
Heeyeop Chae ◽  
...  
Keyword(s):  
Aluminum Oxide ◽  
Barrier Property ◽  
Plasma Polymer ◽  
Moisture Barrier ◽  
Moisture Barrier Property

The Influence of Moisture Barrier Films in ZnO-Based Thin Film Transistors

2012 ◽  
Vol 159 (4) ◽  
pp. H353-H357 ◽  
Author(s):  
Woong-Sun Kim ◽  
Sae-Young Shin ◽  
Jong-Wan Park
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Moisture Barrier ◽  
Barrier Films

Highly-impermeable Al2O3/HfO2 moisture barrier films grown by low-temperature plasma-enhanced atomic layer deposition

2017 ◽  
Vol 50 ◽  
pp. 296-303 ◽  
Author(s):  
Lae Ho Kim ◽  
Jin Hyuk Jang ◽  
Yong Jin Jeong ◽  
Kyunghun Kim ◽  
Yonghwa Baek ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Moisture Barrier ◽  
Barrier Films ◽  
Layer Deposition
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