Mixed oxide AlTi films obtained by sputtering of a segmented target

1993 ◽  
Vol 140 (2) ◽  
pp. K81-K84 ◽  
Author(s):  
A. Czapla ◽  
E. Kusior
1975 ◽  
Vol 72 ◽  
pp. 1059-1064 ◽  
Author(s):  
David Dollimore ◽  
Andrew Galwey ◽  
Graham Rickety
Keyword(s):  

2013 ◽  
Vol 33 (7) ◽  
pp. 1176-1182
Author(s):  
Xinxing WANG ◽  
Xueguang WANG ◽  
Xingfu SHANG ◽  
Wangxin NIE ◽  
Xiujing ZOU ◽  
...  

2005 ◽  
Author(s):  
S. A. Hodge ◽  
R. N. Morris ◽  
L. J. Ott

ACS Catalysis ◽  
2021 ◽  
pp. 10294-10307
Author(s):  
Satoshi Ishikawa ◽  
Yudai Yamada ◽  
Naoki Kashio ◽  
Nagisa Noda ◽  
Kosuke Shimoda ◽  
...  

2021 ◽  
Vol 6 (4) ◽  
pp. 522-531
Author(s):  
Yihao Liu ◽  
Peng Zhao ◽  
Liang Sun ◽  
Nengjie Feng ◽  
Lei Wang ◽  
...  

2021 ◽  
pp. 1-9
Author(s):  
Richard M. Ambrosi ◽  
Daniel P. Kramer ◽  
Emily Jane Watkinson ◽  
Ramy Mesalam ◽  
Alessandra Barco

2011 ◽  
Vol 110-116 ◽  
pp. 1094-1098
Author(s):  
Haleh Kangarlou ◽  
Mehdi Bahrami Gharahasanloo ◽  
Akbar Abdi Saray ◽  
Reza Mohammadi Gharabagh

Ti films of same thickness, and near normal deposition angle, and same deposition rate were deposited on glass substrates, at room temperature, under UHV conditions. Different annealing temperatures as 393K, 493K and 593K with uniform 8 cm3/sec, oxygen flow, were used for producing titanium oxide layers. Their nanostructures were determined by AFM and XRD methods. Roughness of the films changed due to annealing process. The gettering property of Ti and annealing temperature can play an important role in the nanostructure of the films.


Sign in / Sign up

Export Citation Format

Share Document