Bias temperature instability analysis on memory properties improved by hydrogen annealing treatment in Ti/HfO x /Pt capacitors

2013 ◽  
Vol 7 (7) ◽  
pp. 497-500 ◽  
Author(s):  
Hee-Dong Kim ◽  
Min Ju Yun ◽  
Seok Man Hong ◽  
Ho-Myoung An ◽  
Tae Geun Kim
Author(s):  
Seyab Khan ◽  
Said Hamdioui ◽  
Halil Kukner ◽  
Praveen Raghavan ◽  
Francky Catthoor

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