Role of sputtering power on the microstructural and electro-optical properties of ITO thin films deposited using DC sputtering technique

2017 ◽  
Vol 13 (1) ◽  
pp. 27-31 ◽  
Author(s):  
A. Kosarian ◽  
M. Shakiba ◽  
E. Farshidi
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Dc Sputtering ◽  
Sputtering Power ◽  
Ito Thin Films ◽  
Dc Sputtering Technique

Effect of gamma irradiation on structural and optical properties of Cd2SnO4 thin films deposited by DC sputtering technique

2014 ◽  
Vol 103 ◽  
pp. 227-233 ◽  
Author(s):  
Ateyyah M. Al-Baradi ◽  
M.M. El-Nahass ◽  
M.M. Abd El-Raheem ◽  
A.A. Atta ◽  
A.M. Hassanien
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Gamma Irradiation ◽  
Structural And Optical Properties ◽  
Dc Sputtering ◽  
Dc Sputtering Technique

Influence of sputtering power on the optical properties of ITO thin films

2014 ◽  
Author(s):  
Aijo John K ◽  
Vineetha V. Kumar ◽  
Deepak M ◽  
Manju T
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Sputtering Power ◽  
Ito Thin Films

scholarly journals Improving Performance of CIGS Solar Cells by Annealing ITO Thin Films Electrodes

2015 ◽  
Vol 2015 ◽  
pp. 1-8 ◽  
Author(s):  
Chuan Lung Chuang ◽  
Ming Wei Chang ◽  
Nien Po Chen ◽  
Chung Chiang Pan ◽  
Chung Ping Liu
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Solar Cells ◽  
Indium Tin Oxide ◽  
Copper Indium Gallium Diselenide ◽  
Glass Substrates ◽  
Ito Film ◽  
Ito Thin Films ◽  
Cigs Solar Cells ◽  
Ito Films

Indium tin oxide (ITO) thin films were grown on glass substrates by direct current (DC) reactive magnetron sputtering at room temperature. Annealing at the optimal temperature can considerably improve the composition, structure, optical properties, and electrical properties of the ITO film. An ITO sample with a favorable crystalline structure was obtained by annealing in fixed oxygen/argon ratio of 0.03 at 400°C for 30 min. The carrier concentration, mobility, resistivity, band gap, transmission in the visible-light region, and transmission in the near-IR regions of the ITO sample were-1.6E+20 cm−3,2.7E+01 cm2/Vs,1.4E-03 Ohm-cm, 3.2 eV, 89.1%, and 94.7%, respectively. Thus, annealing improved the average transmissions (400–1200 nm) of the ITO film by 16.36%. Moreover, annealing a copper-indium-gallium-diselenide (CIGS) solar cell at 400°C for 30 min in air improved its efficiency by 18.75%. The characteristics of annealing ITO films importantly affect the structural, morphological, electrical, and optical properties of ITO films that are used in solar cells.

AFM and XPS Characterization of TiN Thin Films Grown on Nanoporous Al2O3 by using the DC Sputtering Technique Assisted by Balanced Magnetron

2007 ◽  
Vol 13 (S02) ◽  
Author(s):  
C. Encinas Baca ◽  
I. Yocupicio ◽  
H. Esparza Ponce ◽  
A. Duarte Moller
Keyword(s):  
Thin Films ◽  
Dc Sputtering ◽  
Xps Characterization ◽  
Tin Thin Films ◽  
Dc Sputtering Technique

ELECTRICAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS PREPARED BY R.F. MAGNETRON SPUTTERING

2011 ◽  
Vol 25 (20) ◽  
pp. 2741-2749 ◽  
Author(s):  
J. C. ZHOU ◽  
L. LI ◽  
L. Y. RONG ◽  
B. X. ZHAO ◽  
Y. M. CHEN ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxide Thin Film ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Electrical And Optical Properties ◽  
Axis Orientation ◽  
Sputtering Power

High transparency and conductivity of transparent conducting oxide thin film are very important for improving the efficiency of solar cells. ZnO thin film is a better candidate for transparent conductive layer of solar cell. N-type ZnO thin films were prepared by radio-frequency magnetron sputtering on glass substrates. ZnO thin films underwent annealing treatment after deposition. The influence of the sputtering power on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV2450 and HMS-3000. The experimental results indicate that the crystal quality of ZnO thin film is improved and all films show higher c-axis orientation with increasing sputtering power from 50 to 125 W. The average transparency of ZnO thin films is higher than 90% in the range of 400–900 nm between the sputtering power of 50–100 W. After the rapid thermal annealing at 550°C for 300 s under N2 ambient, the minimum resistivity reach to 10-2Ω⋅ cm .

Role of Deposition Potential on the Optical Properties of SnSSe Thin Films

2019 ◽  
Vol 35 (37) ◽  
pp. 1-10 ◽  
Author(s):  
Thaiyan Mahalingam ◽  
Vickraman Dhanasekaran ◽  
Ganesan Ravi ◽  
Rathinam Chandramohan ◽  
Adaikalam Kathalingam ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Deposition Potential

Enhanced magnetic, antibacterial and optical properties of Sm doped ZnO thin films: Role of Sm doping

2020 ◽  
Vol 108 ◽  
pp. 110457 ◽  
Author(s):  
Zohra Nazir Kayani ◽  
Madia Sahar ◽  
Saira Riaz ◽  
Shahzad Naseem ◽  
Zeb Saddiqe
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Zno Thin Films ◽  
Doped Zno

Role of ceramic matrix and Au fraction on the morphology and optical properties of cosputtered Au-ceramic thin films

2007 ◽  
Vol 101 (11) ◽  
pp. 113532 ◽  
Author(s):  
S. Hazra ◽  
A. Gibaud ◽  
C. Sella
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Ceramic Matrix ◽  
Ceramic Thin Films

Structural and optical properties of ITO and Cu doped ITO thin films

2018 ◽  
Author(s):  
Deepannita Chakraborty ◽  
S. Kaleemulla ◽  
N. Madhusudhana Rao ◽  
K. Subbaravamma ◽  
G. Venugopal Rao
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Structural And Optical Properties ◽  
Ito Thin Films
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