Raman Spectroscopy of CVD Carbon Thin Films Excited by Near-Infrared Light

2006 ◽  
pp. 423-445 ◽  
Author(s):  
Margit Koós ◽  
Miklós Veres ◽  
Sára Tóth ◽  
Miklós Füle
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Near Infrared ◽  
Infrared Light ◽  
Near Infrared Light ◽  
Carbon Thin Films

Near-Infrared Light Absorption Enhancement in Graphene Induced by the Tamm State in Optical Thin Films

2019 ◽  
Vol 39 (1) ◽  
pp. 0131001
Author(s):  
黎志文 Li Zhiwen ◽  
陆华 Lu Hua ◽  
李扬武 Li Yangwu ◽  
焦晗 Jiao Han ◽  
赵建林 Zhao Jianlin
Keyword(s):  
Thin Films ◽  
Light Absorption ◽  
Near Infrared ◽  
Infrared Light ◽  
Absorption Enhancement ◽  
Near Infrared Light ◽  
Tamm State

Near-infrared light emission of Er3+-doped zirconium oxide thin films: An optical, structural and XPS study

2015 ◽  
Vol 619 ◽  
pp. 800-806 ◽  
Author(s):  
J.L. Clabel H. ◽  
V.A.G. Rivera ◽  
M. Siu Li ◽  
L.A.O. Nunes ◽  
E.R. Leite ◽  
...  
Keyword(s):  
Thin Films ◽  
Zirconium Oxide ◽  
Near Infrared ◽  
Light Emission ◽  
Infrared Light ◽  
Oxide Thin Films ◽  
Near Infrared Light ◽  
Xps Study

Bistable and photo-switchable thin films for efficient visible and near-infrared light manipulation (Conference Presentation)

2018 ◽  
Author(s):  
Malgosia Kaczmarek ◽  
Eleni Perivolari ◽  
Jordan Gill ◽  
Nina Podoliak ◽  
Elena Mavrona ◽  
...  
Keyword(s):  
Thin Films ◽  
Near Infrared ◽  
Infrared Light ◽  
Near Infrared Light ◽  
Light Manipulation

scholarly journals Electrodeposition-Based Fabrication and Characteristics of Tungsten Trioxide Thin Film

2016 ◽  
Vol 2016 ◽  
pp. 1-12 ◽  
Author(s):  
Li Lin ◽  
Chin-Pao Cheng ◽  
Tun-Ping Teng
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Tungsten Trioxide ◽  
Near Infrared ◽  
Infrared Light ◽  
Near Infrared Light ◽  
Coated Glass ◽  
Ito Glass

In this study, tungsten trioxide (WO3) thin films were electrodeposited on indium tin oxide (ITO) glass to form WO3-coated glass. The electrodeposition (ED) time (tED) and ED current (IED) were varied to control the film thickness and morphology. Furthermore, the crystallization of the thin films was controlled by annealing them at 250°C, 500°C, and 700°C. The results showed that the thickness of the WO3thin films increased withtEDandIED. The as-deposited thin films and those annealed at 250°C were amorphous, whereas the WO3thin films annealed at 500 and 700°C were in the anorthic phase. Moreover, the amorphous WO3-coated glass exhibited high transmittance in visible light and low transmittance in near-infrared light, whereas the anorthic WO3-coated glass had high transmittance in near-infrared light. An empirical formula for determining the thickness of WO3thin films was derived through multiple regressions of the ED process parameters.

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