The Thickness Measurements of Thin Bulk Film By X-Ray Method

1991 ◽  
pp. 567-575 ◽  
Author(s):  
Y. Hirose ◽  
N. Takano ◽  
Y. Nanayama ◽  
T. Mura
1990 ◽  
Vol 34 ◽  
pp. 567-575 ◽  
Author(s):  
Y. Hirose ◽  
N. Takano ◽  
Y. Nanayama ◽  
T. Mura

There are many investigations about thin film. However, these are limited to the surface layer thin film on substrates. It Is very important to know the characteristics of the extremely thin film itself such as surface layer thin film.In the present paper, the first part deals with the thickness measurements of the surface layer film and substrate by means of x-ray method, and then the measurement method of their stress - strain curves and the procedure of the measurement are described. The results obtained are discussed on the basis of their stress — strain curves.


Author(s):  
S. Fujishiro

The mechanical properties of three titanium alloys (Ti-7Mo-3Al, Ti-7Mo- 3Cu and Ti-7Mo-3Ta) were evaluated as function of: 1) Solutionizing in the beta field and aging, 2) Thermal Mechanical Processing in the beta field and aging, 3) Solutionizing in the alpha + beta field and aging. The samples were isothermally aged in the temperature range 300° to 700*C for 4 to 24 hours, followed by a water quench. Transmission electron microscopy and X-ray method were used to identify the phase formed. All three alloys solutionized at 1050°C (beta field) transformed to martensitic alpha (alpha prime) upon being water quenched. Despite this heavily strained alpha prime, which is characterized by microtwins the tensile strength of the as-quenched alloys is relatively low and the elongation is as high as 30%.


Author(s):  
C. W. Price ◽  
E. F. Lindsey

Thickness measurements of thin films are performed by both energy-dispersive x-ray spectroscopy (EDS) and x-ray fluorescence (XRF). XRF can measure thicker films than EDS, and XRF measurements also have somewhat greater precision than EDS measurements. However, small components with curved or irregular shapes that are used for various applications in the the Inertial Confinement Fusion program at LLNL present geometrical problems that are not conducive to XRF analyses but may have only a minimal effect on EDS analyses. This work describes the development of an EDS technique to measure the thickness of electroless nickel deposits on gold substrates. Although elaborate correction techniques have been developed for thin-film measurements by x-ray analysis, the thickness of electroless nickel films can be dependent on the plating bath used. Therefore, standard calibration curves were established by correlating EDS data with thickness measurements that were obtained by contact profilometry.


1984 ◽  
Vol 45 (C2) ◽  
pp. C2-33-C2-36 ◽  
Author(s):  
D. A. Sewell ◽  
I. D. Hall ◽  
G. Love ◽  
J. P. Partridge ◽  
V. D. Scott

2019 ◽  
Vol 55 (4) ◽  
pp. 308-321 ◽  
Author(s):  
S. P. Osipov ◽  
E. Yu. Usachev ◽  
S. V. Chakhlov ◽  
S. A. Shchetinkin ◽  
O. S. Osipov

2002 ◽  
Vol 404-407 ◽  
pp. 19-24 ◽  
Author(s):  
Jean Michel Sprauel ◽  
H. Michaud
Keyword(s):  
X Ray ◽  

Langmuir ◽  
2014 ◽  
Vol 30 (13) ◽  
pp. 3749-3753 ◽  
Author(s):  
Shinjiro Fujiyama ◽  
Natsumi Kamiya ◽  
Koji Nishi ◽  
Yoshinobu Yokomori

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