Structural and Electrical Characteristics of HfO2 Film Deposited by RF Sputtering and Plasma Enhanced Atomic Layer Deposition

2019 ◽  
pp. 517-524 ◽  
Author(s):  
Prashant Singh ◽  
Rajesh Kumar Jha ◽  
Rajat Kumar Singh ◽  
B. R. Singh
Keyword(s):  
Atomic Layer Deposition ◽  
Rf Sputtering ◽  
Atomic Layer ◽  
Electrical Characteristics ◽  
Hfo2 Film ◽  
Layer Deposition

Hysteresis-free HfO2 film grown by atomic layer deposition at low temperature

2011 ◽  
Vol 519 (22) ◽  
pp. 7723-7726 ◽  
Author(s):  
J. Shen ◽  
C.Y. Zhang ◽  
T.T. Xu ◽  
A.N. Jiang ◽  
Z.Y. Zhang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Hfo2 Film ◽  
Layer Deposition

scholarly journals Influence of Oxidant Gas of Atomic Layer Deposition on Electrical Characteristics of Al2O3 films

2018 ◽  
Vol 61 (5) ◽  
pp. 280-285 ◽  
Author(s):  
Toshihide NABATAME ◽  
Masayuki KIMURA ◽  
Kazuya YUGE ◽  
Mari INOUE ◽  
Naoki IKEDA ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Electrical Characteristics ◽  
Layer Deposition
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